JS

Jin Wuk Sung

RM Rohm And Haas Electronic Materials: 17 patents #29 of 562Top 6%
Dow Global Technologies: 9 patents #497 of 4,534Top 15%
DI Dupont Electronic Materials International: 1 patents #11 of 36Top 35%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
🗺 Massachusetts: #5,623 of 88,656 inventorsTop 7%
Overall (All Time): #216,230 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
12372867 Photoresists comprising multiple acid generator compounds James W. Thackeray, Paul J. LaBeaume, Vipul Jain 2025-07-29
10703917 Coating compositions suitable for use with an overcoated photoresist John P. Amara, James F. Cameron, Gregory P. Prokopowicz 2020-07-07
10539873 Coating compositions suitable for use with an overcoated photoresist James F. Cameron, John P. Amara, Gregory P. Prokopowicz, David A. Valeri 2020-01-21
10133179 Pattern treatment methods Mingqi Li, Jong Keun Park, Joshua Kaitz, Vipul Jain, Chunyi Wu +1 more 2018-11-20
10042255 Block copolymers and pattern treatment compositions and methods Huaxing Zhou, Vipul Jain, Peter Trefonas, III, Phillip D. Hustad, Mingqi Li 2018-08-07
9910355 Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom Phillip D. Hustad, Jong Keun Park, Jieqian Zhang, Vipul Jain 2018-03-06
9910353 Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom Phillip D. Hustad, Jong Keun Park, Jieqian Zhang, Vipul Jain 2018-03-06
9726977 Coating compositions suitable for use with an overcoated photoresist James F. Cameron, John P. Amara, Greogory P. Prokopowicz, David A. Valeri, Libor Vyklicky +4 more 2017-08-08
9708493 Coating compositions suitable for use with an overcoated photoresist John P. Amara, James F. Cameron, Gregory P. Prokopowicz 2017-07-18
9703203 Compositions and methods for pattern treatment Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad 2017-07-11
9684241 Compositions and methods for pattern treatment Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad 2017-06-20
9671697 Pattern treatment methods Huaxing Zhou, Mingqi Li, Vipul Jain, Jong Keun Park, Phillip D. Hustad 2017-06-06
9665005 Pattern treatment methods Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad 2017-05-30
9499513 Acid generators and photoresists comprising same James F. Cameron, Vipul Jain, Paul J. LaBeaume, James W. Thackeray 2016-11-22
9448483 Pattern shrink methods Phillip D. Hustad, Jong Keun Park, James Park 2016-09-20
8945814 Acid generators and photoresists comprising same James F. Cameron, Vipul Jain, Paul J. LaBeaume, James W. Thackeray 2015-02-03
8940472 Coating compositions suitable for use with an overcoated photoresist James F. Cameron, John P. Amara, Greogory P. Prokopowicz, David A. Valeri 2015-01-27
8883407 Coating compositions suitable for use with an overcoated photoresist John P. Amara, James F. Cameron, Gregory P. Prokopowicz 2014-11-11
7326518 Photoresist compositions James F. Cameron, Dong Woo Lee, Peter Trefonas, III, Gary J. Swanson 2008-02-05
7297616 Methods, photoresists and substrates for ion-implant lithography James F. Cameron, Peter Trefonas, III, George G. Barclay 2007-11-20