Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11809077 | Photoresist compositions and pattern formation methods | Thomas Cardolaccia, Jason A. DeSisto, Choong-Bong Lee, Mingqi Li, Tomas Marangoni +2 more | 2023-11-07 |
| 10719014 | Photoresists comprising amide component | Cong Liu, Chunyi Wu, Gerhard Pohlers, Mingqi Li, Cheng-Bai Xu | 2020-07-21 |
| 10703917 | Coating compositions suitable for use with an overcoated photoresist | John P. Amara, James F. Cameron, Jin Wuk Sung | 2020-07-07 |
| 10539873 | Coating compositions suitable for use with an overcoated photoresist | James F. Cameron, Jin Wuk Sung, John P. Amara, David A. Valeri | 2020-01-21 |
| 10474032 | Coating compositions | Michael K. Gallagher | 2019-11-12 |
| 9745479 | Adhesion promoter | Zidong Wang, Michael K. Gallagher, Kevin Y. Wang | 2017-08-29 |
| 9708493 | Coating compositions suitable for use with an overcoated photoresist | John P. Amara, James F. Cameron, Jin Wuk Sung | 2017-07-18 |
| 9475763 | Photoresist comprising nitrogen-containing compound | Cong Liu, Chunyi Wu, Gerhard Pohlers, Cheng-Bai Xu | 2016-10-25 |
| 9273215 | Adhesion promoter | Zidong Wang, Michael K. Gallagher, Kevin Y. Wang | 2016-03-01 |
| 9153357 | Adhesion promoter | Michael K. Gallagher, Joseph F. Lachowski, Zidong Wang | 2015-10-06 |
| 9136037 | Adhesion promoter | Michael K. Gallagher, Joseph F. Lachowski, Zidong Wang | 2015-09-15 |
| 9110369 | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device | Emad Aqad, Irvinder Kaur, Cong Liu, Cheng-Bai Xu, Mingqi Li | 2015-08-18 |
| 8927190 | Photoresist comprising nitrogen-containing compound | Cong Liu, Chunyi Wu, Gerhard Pohlers, Cheng-Bai Xu | 2015-01-06 |
| 8911927 | Compositions and processes for immersion lithography | Michael K. Gallagher, Gerald B. Wayton, Stewart Robertson | 2014-12-16 |
| 8889344 | Coating compositions | Michael K. Gallagher | 2014-11-18 |
| 8883407 | Coating compositions suitable for use with an overcoated photoresist | John P. Amara, James F. Cameron, Jin Wuk Sung | 2014-11-11 |
| 8603728 | Polymer composition and photoresist comprising the polymer | Gerhard Polhers, Mingqi Li, Chunyi Wu, Cong Liu, Cheng-Bai Xu | 2013-12-10 |
| 7781141 | Compositions and processes for immersion lithography | Michael K. Gallagher, Gerald B. Wayton, Stewart Robertson | 2010-08-24 |
| 7018678 | Electronic device manufacture | Dana Gronbeck, Michael K. Gallagher, Jeffrey M. Calvert, Timothy G. Adams | 2006-03-28 |