Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12287576 | Underlayer compositions and patterning methods | Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, James F. Cameron +2 more | 2025-04-29 |
| 12276910 | Photoresist compositions and pattern formation methods | Brandon Wenning, Choong-Bong Lee, James W. Thackeray, Ke Yang, James F. Cameron | 2025-04-15 |
| 12140866 | Photoacid generators, photoresist compositions, and pattern formation methods | — | 2024-11-12 |
| 11960206 | Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device | William Williams, III, James F. Cameron | 2024-04-16 |
| 11947258 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | James W. Thackeray, James F. Cameron | 2024-04-02 |
| 11932713 | Monomers, polymers and lithographic compositions comprising same | James F. Cameron, James W. Thackeray | 2024-03-19 |
| 11880134 | Salts and photoresists comprising same | James F. Cameron, James W. Thackeray | 2024-01-23 |
| 11852972 | Photoresist compositions and pattern formation methods | Tomas Marangoni, James W. Thackeray, James F. Cameron, Xisen Hou, ChoongBong Lee | 2023-12-26 |
| 11829069 | Photoresist compositions and methods | Joshua Kaitz, Tomas Marangoni, Amy M. Kwok, Mingqi Li, Thomas Cardolaccia +3 more | 2023-11-28 |
| 11613519 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | James W. Thackeray, James F. Cameron | 2023-03-28 |
| 11567408 | Coating composition for use with an overcoated photoresist | Hye-Won Lee, Min-Kyung Jang, Soo Jung Leem, Jae Hwan Sim | 2023-01-31 |
| 11550217 | Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device | William Williams, III, James F. Cameron | 2023-01-10 |
| 11505565 | Zwitterion compounds and photoresists comprising same | James F. Cameron, James W. Thackeray | 2022-11-22 |
| 11448960 | Salts and photoresists comprising same | James F. Cameron, James W. Thackeray | 2022-09-20 |
| 11269252 | Method for forming pattern using antireflective coating composition including photoacid generator | Jung-June Lee, Jae Yun Ahn, Jae Hwan Sim, Jae-Bong Lim, Myung Yeol Kim | 2022-03-08 |
| 10901316 | Iodine-containing polymers for chemically amplified resist compositions | James W. Thackeray, James F. Cameron | 2021-01-26 |
| 10831100 | Iodine-containing photoacid generators and compositions comprising the same | James W. Thackeray | 2020-11-10 |
| 10809616 | Cholate photoacid generators and photoresists comprising same | Mingqi Li, Joseph Mattia, Cheng-Bai Xu | 2020-10-20 |
| 10670965 | Polymers and photoresist compositions | Cong Liu, Cheng-Bai Xu, Mingqi Li | 2020-06-02 |
| 10509315 | Photoacid generator | William Williams, III, James F. Cameron | 2019-12-17 |
| 10495968 | Iodine-containing polymers for chemically amplified resist compositions | James W. Thackeray, James F. Cameron | 2019-12-03 |
| 10317795 | Photoacid generator | William Williams, III, James F. Cameron | 2019-06-11 |
| 10095109 | Acid-cleavable monomer and polymers including the same | James W. Thackeray | 2018-10-09 |
| 10088749 | Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image | — | 2018-10-02 |
| 9921475 | Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image | William Williams, III, Cong Liu | 2018-03-20 |