Issued Patents All Time
Showing 1–25 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372867 | Photoresists comprising multiple acid generator compounds | Jin Wuk Sung, Paul J. LaBeaume, Vipul Jain | 2025-07-29 |
| 12276910 | Photoresist compositions and pattern formation methods | Emad Aqad, Brandon Wenning, Choong-Bong Lee, Ke Yang, James F. Cameron | 2025-04-15 |
| 11947258 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Emad Aqad, James F. Cameron | 2024-04-02 |
| 11932713 | Monomers, polymers and lithographic compositions comprising same | Emad Aqad, James F. Cameron | 2024-03-19 |
| 11880134 | Salts and photoresists comprising same | Emad Aqad, James F. Cameron | 2024-01-23 |
| 11852972 | Photoresist compositions and pattern formation methods | Tomas Marangoni, Emad Aqad, James F. Cameron, Xisen Hou, ChoongBong Lee | 2023-12-26 |
| 11613519 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Emad Aqad, James F. Cameron | 2023-03-28 |
| 11505565 | Zwitterion compounds and photoresists comprising same | Emad Aqad, James F. Cameron | 2022-11-22 |
| 11448960 | Salts and photoresists comprising same | Emad Aqad, James F. Cameron | 2022-09-20 |
| 10901316 | Iodine-containing polymers for chemically amplified resist compositions | Emad Aqad, James F. Cameron | 2021-01-26 |
| 10831100 | Iodine-containing photoacid generators and compositions comprising the same | Emad Aqad | 2020-11-10 |
| 10495968 | Iodine-containing polymers for chemically amplified resist compositions | Emad Aqad, James F. Cameron | 2019-12-03 |
| 10248020 | Acid generators and photoresists comprising same | Paul J. LaBeaume, James F. Cameron | 2019-04-02 |
| 10095109 | Acid-cleavable monomer and polymers including the same | Emad Aqad | 2018-10-09 |
| 10078261 | Self-assembled structures, method of manufacture thereof and articles comprising the same | Sangho Cho, Guorong Sun, Karen L. Wooley, Peter Trefonas, III | 2018-09-18 |
| 9983477 | Polymers and photoresist compositions | Roger A. Nassar | 2018-05-29 |
| 9957339 | Copolymer and associated layered article, and device-forming method | Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker | 2018-05-01 |
| 9815930 | Block copolymer and associated photoresist composition and method of forming an electronic device | Ke Du, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker | 2017-11-14 |
| 9696624 | Nanoparticle-polymer resists | Meiliana Siauw, Peter Trefonas, III, Idriss Blakey, Andrew Keith Whittaker | 2017-07-04 |
| 9606434 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | Paul J. LaBeaume, Vipul Jain, James F. Cameron, Suzanne M. Coley, Amy M. Kwok +1 more | 2017-03-28 |
| 9581901 | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device | Vipul Jain, Owendi Ongayi, James F. Cameron | 2017-02-28 |
| 9557642 | Photoresist composition and associated method of forming an electronic device | Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James F. Cameron, Amy M. Kwok +1 more | 2017-01-31 |
| 9551930 | Photoresist composition and associated method of forming an electronic device | Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James F. Cameron, Amy M. Kwok +1 more | 2017-01-24 |
| 9527936 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | Vipul Jain, Paul J. LaBeaume, James F. Cameron, Suzanne M. Coley, Amy M. Kwok +1 more | 2016-12-27 |
| 9508549 | Methods of forming electronic devices including filling porous features with a polymer | Jong Keun Park, Phillip D. Hustad, Emad Aqad, Mingqi Li, Cheng-Bai Xu +1 more | 2016-11-29 |