JT

James W. Thackeray

SL Shipley Company, L.L.C.: 46 patents #1 of 401Top 1%
RM Rohm And Haas Electronic Materials: 42 patents #11 of 562Top 2%
TS Texas A&M University System: 5 patents #124 of 1,706Top 8%
IBM: 4 patents #21,733 of 70,183Top 35%
Dow Global Technologies: 4 patents #1,176 of 4,534Top 30%
TQ The University Of Queensland: 3 patents #49 of 555Top 9%
DI Dupont Electronic Materials International: 2 patents #5 of 36Top 15%
GE: 2 patents #13,562 of 36,430Top 40%
Rohm And Haas: 1 patents #1,282 of 2,359Top 55%
📍 Braintree, MA: #1 of 219 inventorsTop 1%
🗺 Massachusetts: #296 of 88,656 inventorsTop 1%
Overall (All Time): #16,372 of 4,157,543Top 1%
94
Patents All Time

Issued Patents All Time

Showing 26–50 of 94 patents

Patent #TitleCo-InventorsDate
9499513 Acid generators and photoresists comprising same James F. Cameron, Vipul Jain, Paul J. LaBeaume, Jin Wuk Sung 2016-11-22
9447220 Self-assembled structures, method of manufacture thereof and articles comprising the same Sangho Cho, Guorong Sun, Karen L. Wooley, Peter Trefonas, III 2016-09-20
9405189 Self-assembled structures, method of manufacture thereof and articles comprising the same Sangho Cho, Guorong Sun, Karen L. Wooley, Peter Trefonas, III 2016-08-02
9229319 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device Vipul Jain, Owendi Ongayi, James F. Cameron 2016-01-05
9223214 Self-assembled structures, method of manufacture thereof and articles comprising the same Sangho Cho, Guorong Sun, Karen L. Wooley, Peter Trefonas, III 2015-12-29
9206276 Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device Owendi Ongayi, James F. Cameron 2015-12-08
9182662 Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom Owendi Ongayi 2015-11-10
9182669 Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device Owendi Ongayi, Vipul Jain, James F. Cameron, Suzanne M. Coley 2015-11-10
8945814 Acid generators and photoresists comprising same James F. Cameron, Vipul Jain, Paul J. LaBeaume, Jin Wuk Sung 2015-02-03
8936900 Calixarene and photoresist composition comprising same Vipul Jain, D. Patrick Green, Brad C. Bailey, Su Jin Kang 2015-01-20
8932797 Photoacid generators Suzanne M. Coley, James F. Cameron, Paul J. LaBeaume, Ahmad E. Madkour, Owendi Ongayi +1 more 2015-01-13
8900792 Polymerizable photoacid generators Suzanne M. Coley, Vipul Jain, Owendi Ongayi, James F. Cameron, Paul J. LaBeaume +1 more 2014-12-02
8822130 Self-assembled structures, method of manufacture thereof and articles comprising the same Sangho Cho, Guorong Sun, Karen L. Wooley, Peter Trefonas, III 2014-09-02
8703383 Photosensitive copolymer and photoresist composition Emad Aqad, Su Jin Kang, Owendi Ongayi 2014-04-22
8507176 Photosensitive compositions Emad Aqad 2013-08-13
7919222 Coating compositions for use with an overcoated photoresist Vaishali Raghu Vohra, Gerald B. Wayton 2011-04-05
7838199 Polymers and photoresist compositions Roger A. Nassar 2010-11-23
7776508 Antihalation compositions George W. Orsula 2010-08-17
7632630 Dyed photoresists and methods and articles of manufacture comprising same James Michael Mori, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams +3 more 2009-12-15
7585612 Coating compositions for use with an overcoated photoresist Gerald B. Wayton, Charles R. Szmanda 2009-09-08
7482107 Photoresist composition James F. Cameron, Roger F. Sinta 2009-01-27
7378222 Antihalation compositions George W. Orsula 2008-05-27
7205087 Solvents and photoresist compositions for 193 nm imaging Robert J. Kavanagh 2007-04-17
7166414 Radiation sensitive compositions and methods Angelo A. Lamola 2007-01-23
7147983 Dyed photoresists and methods and articles of manufacture comprising same James Michael Mori, Roger F. Sinta, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams +3 more 2006-12-12