GO

George W. Orsula

SL Shipley Company, L.L.C.: 18 patents #14 of 401Top 4%
IBM: 2 patents #32,839 of 70,183Top 50%
RM Rohm And Haas Electronic Materials: 1 patents #369 of 562Top 70%
📍 Tewksbury, MA: #16 of 382 inventorsTop 5%
🗺 Massachusetts: #5,256 of 88,656 inventorsTop 6%
Overall (All Time): #211,069 of 4,157,543Top 6%
21
Patents All Time

Issued Patents All Time

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
7776508 Antihalation compositions James W. Thackeray 2010-08-17
7704668 Photoresist compositions and methods and articles of manufacture comprising same James F. Cameron, James Michael Mori, Guangyu Xu, Yoshihiro Yamamoto 2010-04-27
7378222 Antihalation compositions James W. Thackeray 2008-05-27
7014982 Antihalation compositions James W. Thackeray 2006-03-21
6803169 Photoresist compositions comprising blends of photoacid generators James F. Cameron, James Michael Mori, James W. Thackeray 2004-10-12
6773864 Antihalation compositions James W. Thackeray 2004-08-10
6528235 Antihalation compositions James W. Thackeray 2003-03-04
6472128 Antihalation compositions James W. Thackeray 2002-10-29
6451503 Antihalation compositions James W. Thackeray 2002-09-17
6203965 Photoresist comprising blends of photoacid generators James F. Cameron, James Michael Mori, James W. Thackeray, Wu-Song Huang, Ronald A. DellaGuardia +3 more 2001-03-20
6200728 Photoresist compositions comprising blends of photoacid generators James F. Cameron, James Michael Mori, James W. Thackeray 2001-03-13
6165697 Antihalation compositions James W. Thackeray 2000-12-26
5919597 Methods for preparing photoresist compositions Roger F. Sinta, Uday Kumar, James I. T. Fahey, William R. Brunsvold, Wu-Song Huang +3 more 1999-07-06
5851738 Method comprising substrates coated with an antihalation layer that contains a resin binder comprising anthracene units James W. Thackeray 1998-12-22
5851730 Substrates coated with an antihalation layer that contains a resin binder comprising anthracene units James W. Thackeray 1998-12-22
5541263 Polymer having inert blocking groups James W. Thackeray, Mark D. Denison, Roger F. Sinta, Sheri L. Ablaza 1996-07-30
5514520 Radiation sensitive composition comprising polymer having inert blocking groups James W. Thackeray, Mark D. Denison, Roger F. Sinta, Sheri L. Ablaza 1996-05-07
5368993 Method of forming relief image having line width less than 0.35 microns utilizing copolymer binder having phenolic and nonaromatic cyclic alcohol units James W. Thackeray, Mark D. Denison 1994-11-29
5340696 Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent James W. Thackeray, Mark D. Denison 1994-08-23
5210000 Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units James W. Thackeray, Roger F. Sinta 1993-05-11
5128232 Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units James W. Thackeray, Roger F. Sinta 1992-07-07