Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9766542 | Negative chemically-amplified photoresist and imaging method thereof | Jia Sun, Xin Chen, Bing Li, Cuimei Diao, Haibo Li +1 more | 2017-09-19 |
| 8945677 | Electronic device manufacture using low-k dielectric materials | Nicholas Anthony Zafiropoulos, Paul Nahass, Roxana Trifu, Redouane Begag, Wendell E. Rhine +4 more | 2015-02-03 |
| 7632630 | Dyed photoresists and methods and articles of manufacture comprising same | James Michael Mori, James W. Thackeray, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams +3 more | 2009-12-15 |
| 7482107 | Photoresist composition | James W. Thackeray, James F. Cameron | 2009-01-27 |
| 7147983 | Dyed photoresists and methods and articles of manufacture comprising same | James Michael Mori, James W. Thackeray, Rosemary Bell, Robin L. Miller-Fahey, Timothy G. Adams +3 more | 2006-12-12 |
| 7026093 | Photoresist compositions | James W. Thackeray, James F. Cameron | 2006-04-11 |
| RE38980 | Photoresist compositions | James W. Thackeray, James F. Cameron | 2006-02-14 |
| 6794109 | Low abosorbing resists for 157 nm lithography | Theodore H. Fedynyshyn, Roderick R. Kunz, Michael Sworin | 2004-09-21 |
| 6770413 | Hydroxyphenyl copolymers and photoresists comprising same | Hiroshi Ito, Ashish A. Pandya | 2004-08-03 |
| 6706461 | Dyed photoresists and methods and articles of manufacture comprising same | Thomas M. Zydowsky | 2004-03-16 |
| 6645698 | Photoresist compositions | James W. Thackeray, James F. Cameron | 2003-11-11 |
| 6602652 | Antireflective coating compositions and exposure methods under 200 nm | Timothy G. Adams, Edward K. Pavelchek, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III | 2003-08-05 |
| 6410209 | Methods utilizing antireflective coating compositions with exposure under 200 nm | Timothy G. Adams, Edward K. Pavelchek, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III | 2002-06-25 |
| 6107425 | Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists | George G. Barclay, Jacque H. Georger, Jr., Mark D. Denison, Sheri L. Ablaza | 2000-08-22 |
| 6077643 | Polymers and photoresist compositions | Uday Kumar, Charles R. Szmanda, Leonard Edward Bogan, Jr. | 2000-06-20 |
| 6048672 | Photoresist compositions and methods and articles of manufacture comprising same | James F. Cameron, Martha M. Rajaratnam, James W. Thackeray | 2000-04-11 |
| 6037107 | Photoresist compositions | James W. Thackeray, James F. Cameron | 2000-03-14 |
| 6033830 | Antireflective coating compositions | Timothy G. Adams, James Michael Mori | 2000-03-07 |
| 5976770 | Dyed photoresists and methods and articles of manufacture comprising same | Thomas M. Zydowsky | 1999-11-02 |
| 5919597 | Methods for preparing photoresist compositions | Uday Kumar, George W. Orsula, James I. T. Fahey, William R. Brunsvold, Wu-Song Huang +3 more | 1999-07-06 |
| 5917024 | Acid labile photoactive composition | Daniel Y. Pai | 1999-06-29 |
| 5900346 | Compositions comprising photoactivator, acid, generator and chain extender | Juan C. Scaiano, Gary Stephen Calabrese | 1999-05-04 |
| 5886102 | Antireflective coating compositions | Timothy G. Adams, James Michael Mori | 1999-03-23 |
| 5858605 | Acid labile photoactive composition | Daniel Y. Pai | 1999-01-12 |
| 5827634 | Positive acid catalyzed resists | James W. Thackeray, Mark D. Denison, Sheri L. Ablaza | 1998-10-27 |