| 6927015 |
Underlayer compositions for multilayer lithographic processes |
Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, Margaret C. Lawson +4 more |
2005-08-09 |
| 6818381 |
Underlayer compositions for multilayer lithographic processes |
Mahmoud Khojasteh, Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, Margaret C. Lawson +4 more |
2004-11-16 |
| 6372406 |
Deactivated aromatic amines as additives in acid-catalyzed resists |
Ahmad D. Katnani, Pushkara R. Varanasi |
2002-04-16 |
| 6344305 |
Radiation sensitive silicon-containing resists |
Qinghuang Lin, Ahmad D. Katnani, Douglas Charles LaTulipe, David E. Seeger, Ali Afzali-Ardakani |
2002-02-05 |
| 6187505 |
Radiation sensitive silicon-containing resists |
Qinghuang Lin, Ahmad D. Katnani, Douglas Charles LaTulipe, David E. Seeger, Ali Afzali-Ardakani |
2001-02-13 |
| 6057080 |
Top antireflective coating film |
George J. Hefferon, Christopher F. Lyons, Wayne M. Moreau, Robert L. Wood |
2000-05-02 |
| 5919597 |
Methods for preparing photoresist compositions |
Roger F. Sinta, Uday Kumar, George W. Orsula, James I. T. Fahey, Wu-Song Huang +3 more |
1999-07-06 |
| 5744537 |
Antireflective coating films |
George J. Hefferon, Christopher F. Lyons, Wayne M. Moreau, Robert L. Wood |
1998-04-28 |
| 5733705 |
Acid Scavengers for use in chemically amplified photoresists |
Nageshwer Rao Bantu, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani, Mahmoud M. Khofasteh +2 more |
1998-03-31 |
| 5667938 |
Acid scavengers for use in chemically amplified photoresists |
Nageshwer Rao Bantu, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh +2 more |
1997-09-16 |
| 5644038 |
Quinone diazo compound containing non-metallic atom |
Ari Aviram, Daniel Bucca, Willard E. Conley, David E. Seeger |
1997-07-01 |
| 5609989 |
Acid scavengers for use in chemically amplified photoresists |
Nageshwer Rao Bantu, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani, Mahmoud Khojasteh +2 more |
1997-03-11 |
| 5567569 |
Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring |
Ari Aviram, Daniel Bucca, Willard E. Conley, David E. Seeger |
1996-10-22 |
| 5552256 |
Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring |
Ari Aviram, Daniel Bucca, Willard E. Conley, David E. Seeger |
1996-09-03 |
| 5338818 |
Silicon containing positive resist for DUV lithography |
Premlatha Jagannathan, Steve S. Miura, Melvin Montgomery, Harbans S. Sachdev, Ratnam Sooriyakumaran |
1994-08-16 |
| 5272042 |
Positive photoresist system for near-UV to visible imaging |
Robert David Allen, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre, Michael G. McMaster +5 more |
1993-12-21 |
| 5164278 |
Speed enhancers for acid sensitized resists |
Christopher J. Knors, Melvin Montgomery, Wayne M. Moreau, Kevin M. Welsh |
1992-11-17 |
| 5023164 |
Highly sensitive dry developable deep UV photoresist |
Philip Chiu, Willard E. Conley, Dale M. Crockatt, Melvin Montgomery, Wayne M. Moreau |
1991-06-11 |
| 4939070 |
Thermally stable photoresists with high sensitivity |
Ming-Fea Chow, Willard E. Conley, Dale M. Crockatt, Jean M. J. Frechet, George J. Hefferon +3 more |
1990-07-03 |
| 4931379 |
High sensitivity resists having autodecomposition temperatures greater than about 160.degree. C. |
Willard E. Conley, Dale M. Crockatt, Nancy Iwamoto |
1990-06-05 |
| 4828964 |
Polyimide formulation for forming a patterned film on a substrate |
Willard E. Conley, Scott Jacobs, George L. Mack, David Paul Merritt, Ann M. Uptmor |
1989-05-09 |
