| 7737040 |
Method of reducing critical dimension bias during fabrication of a semiconductor device |
Christopher Dennis Bencher, Alexander Buxbaum, Yung-Hee Yvette Lee, Jian Ding, Gilad Almogy +1 more |
2010-06-15 |
| 7468227 |
Method of reducing the average process bias during production of a reticle |
Alexander Buxbaum |
2008-12-23 |
| 7365014 |
Reticle fabrication using a removable hard mask |
Christopher Dennis Bencher, Alexander Buxbaum, Yung-Hee Yvette Lee, Jian Ding, Gilad Almogy +1 more |
2008-04-29 |
| 7244334 |
Apparatus used in reshaping a surface of a photoresist |
Alex Buxbaum |
2007-07-17 |
| 7208249 |
Method of producing a patterned photoresist used to prepare high performance photomasks |
Alex Buxbaum, Scott Edward Fuller, Cecilia Annette Montgomery |
2007-04-24 |
| 7135256 |
Method of increasing the shelf life of a photomask substrate |
Jeffrey Albelo, Zoilo Cheng Ho Tan |
2006-11-14 |
| 7067227 |
Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
Christopher Hamaker |
2006-06-27 |
| 6998206 |
Method of increasing the shelf life of a blank photomask substrate |
Scott Edward Fuller, Jeffrey Albelo, Alex Buxbaum |
2006-02-14 |
| 6969569 |
Method of extending the stability of a photoresist during direct writing of an image |
Cecilia Annette Montgomery |
2005-11-29 |
| 6931619 |
Apparatus for reshaping a patterned organic photoresist surface |
Alex Buxbaum |
2005-08-16 |
| 6727047 |
Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
Cecilia Annette Montgomery |
2004-04-27 |
| 6703169 |
Method of preparing optically imaged high performance photomasks |
Scott Edward Fuller, Jeffrey Albelo, Alex Buxbaum |
2004-03-09 |
| 6605394 |
Organic bottom antireflective coating for high performance mask making using optical imaging |
Jeffrey Albelo |
2003-08-12 |
| 6582861 |
Method of reshaping a patterned organic photoresist surface |
Alex Buxbaum |
2003-06-24 |
| 6258514 |
Top surface imaging technique using a topcoat delivery system |
— |
2001-07-10 |
| 5362599 |
Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds |
Christopher J. Knors, Steve S. Miura, Wayne M. Moreau, Randolph J. Smith |
1994-11-08 |
| 5338818 |
Silicon containing positive resist for DUV lithography |
William R. Brunsvold, Premlatha Jagannathan, Steve S. Miura, Harbans S. Sachdev, Ratnam Sooriyakumaran |
1994-08-16 |
| 5272042 |
Positive photoresist system for near-UV to visible imaging |
Robert David Allen, William R. Brunsvold, Burton J. Carpenter, William D. Hinsberg, Joseph LaTorre +5 more |
1993-12-21 |
| 5164278 |
Speed enhancers for acid sensitized resists |
William R. Brunsvold, Christopher J. Knors, Wayne M. Moreau, Kevin M. Welsh |
1992-11-17 |
| 5023164 |
Highly sensitive dry developable deep UV photoresist |
William R. Brunsvold, Philip Chiu, Willard E. Conley, Dale M. Crockatt, Wayne M. Moreau |
1991-06-11 |
