CM

Cecilia Annette Montgomery

Applied Materials: 3 patents #2,994 of 7,310Top 45%
📍 Camas, WA: #136 of 330 inventorsTop 45%
🗺 Washington: #27,877 of 76,902 inventorsTop 40%
Overall (All Time): #1,587,047 of 4,157,543Top 40%
3
Patents All Time

Issued Patents All Time

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
7208249 Method of producing a patterned photoresist used to prepare high performance photomasks Melvin Montgomery, Alex Buxbaum, Scott Edward Fuller 2007-04-24
6969569 Method of extending the stability of a photoresist during direct writing of an image Melvin Montgomery 2005-11-29
6727047 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist Melvin Montgomery 2004-04-27