YL

Yung-Hee Yvette Lee

Applied Materials: 7 patents #1,721 of 7,310Top 25%
Samsung: 6 patents #19,812 of 75,807Top 30%
University of California: 4 patents #2,189 of 18,278Top 15%
📍 Seojong-myeon, CA: #34 of 125 inventorsTop 30%
Overall (All Time): #275,496 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
10157989 Graphene electronic device and manufacturing method thereof Chang-seung Lee, Sang-wook Kim, Seong Jun Park, David Seo, Young-jun Yun 2018-12-18
9054708 Touch sensor and touch panel including the same Sang-wook Kim, Seong Jun Park, David Seo, Young-jun Yun, Chang-seung Lee 2015-06-09
8742400 Graphene switching device including tunable barrier David Seo, Sang-wook Kim, Seong Jun Park, Young-jun Yun, Chang-seung Lee 2014-06-03
8202441 Process for etching a metal layer suitable for use in photomask fabrication Madhavi R. Chandrachood, Nicole Sandlin, Jian Ding 2012-06-19
7858464 Methods of manufacturing non-volatile memory devices having insulating layers treated using neutral beam irradiation Soo Doo Chae, Chung-woo Kim, Choong-Man Lee, Chan-Jin Park, Sung-Wook Hwang +3 more 2010-12-28
7804250 Apparatus and method to generate plasma Andrey Ushakov, Yuri Tolmachev, Vladimir Volynets, Won Ceak Pak, Vasily Pashkovskiy +1 more 2010-09-28
7737040 Method of reducing critical dimension bias during fabrication of a semiconductor device Christopher Dennis Bencher, Melvin Montgomery, Alexander Buxbaum, Jian Ding, Gilad Almogy +1 more 2010-06-15
7682518 Process for etching a metal layer suitable for use in photomask fabrication Madhavi R. Chandrachood, Nicole Sandlin, Jian Ding 2010-03-23
7521000 Process for etching photomasks Madhavi R. Chandrachood, Nicole Sandlin, Jian Ding 2009-04-21
7365014 Reticle fabrication using a removable hard mask Christopher Dennis Bencher, Melvin Montgomery, Alexander Buxbaum, Jian Ding, Gilad Almogy +1 more 2008-04-29
7285788 Ion beam extractor Yun-Kwang Jeon, Jin Seok Lee 2007-10-23
7250309 Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control Alfred Mak, Cynthia B. Brooks, Melisa Buie, Turgut Sahin, Jian Ding 2007-07-31
6921723 Etching method having high silicon-to-photoresist selectivity Shashank Deshmukh 2005-07-26
6486480 Plasma formed ion beam projection lithography system Ka-Ngo Leung, Vinh X. Ngo, Nastaran Zahir 2002-11-26
6124834 Glass antenna for RF-ion source operation Ka-Ngo Leung, Luke T. Perkins 2000-09-26
6094012 Low energy spread ion source with a coaxial magnetic filter Ka-Ngo Leung 2000-07-25
5945677 Focused ion beam system Ka-Ngo Leung, Richard A. Gough, Qing Ji 1999-08-31