Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7294205 | Method for reducing the intrinsic stress of high density plasma films | K. V. Ravi, Kent Rossman, Pravin K. Narwankar | 2007-11-13 |
| 7250309 | Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control | Alfred Mak, Yung-Hee Yvette Lee, Cynthia B. Brooks, Melisa Buie, Jian Ding | 2007-07-31 |
| 6624064 | Chamber seasoning method to improve adhesion of F-containing dielectric film to metal for VLSI application | Yaxin Wang, Ming Xi | 2003-09-23 |
| 6579811 | Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating | Pravin K. Narwankar, Sameer Desai, Walter Zygmunt, Laxman Murugesh | 2003-06-17 |
| 6518203 | Method and apparatus for integrating a metal nitride film in a semiconductor device | Pravin K. Narwankar | 2003-02-11 |
| 6465051 | Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling | Fred C. Redeker, Romuald Nowak, Shijian Li, Timothy Dyer, Derek R. Witty | 2002-10-15 |
| 6454860 | Deposition reactor having vaporizing, mixing and cleaning capabilities | Craig Metzner, Gregory Redinbo, Pravin K. Narwankar, Patricia M. Liu | 2002-09-24 |
| 6450116 | Apparatus for exposing a substrate to plasma radicals | David B. Noble, Ravi Jallepally, Nathan D'Astici, Gary E. Miner, Guangcai Xing +1 more | 2002-09-17 |
| 6387761 | Anneal for enhancing the electrical characteristic of semiconductor devices | Wong-Cheng Shih, Pravin K. Narwankar, Randall S. Urdahl | 2002-05-14 |
| 6383954 | Process gas distribution for forming stable fluorine-doped silicate glass and other films | Yaxin Wang, Diana Chan, Tetsuya Ishikawa, Farhad Moghadam | 2002-05-07 |
| 6379466 | Temperature controlled gas distribution plate | Salvador P. Umotoy, Avi Tepman, Ronald L. Rose | 2002-04-30 |
| 6375744 | Sequential in-situ heating and deposition of halogen-doped silicon oxide | Laxman Murugesh, Maciek Orczyk, Pravin Narawankar, Jianmin Qiao | 2002-04-23 |
| 6337289 | Method and apparatus for integrating a metal nitride film in a semiconductor device | Pravin K. Narwankar | 2002-01-08 |
| 6323119 | CVD deposition method to improve adhesion of F-containing dielectric metal lines for VLSI application | Ming Xi, Yaxin Wang | 2001-11-27 |
| 6228781 | Sequential in-situ heating and deposition of halogen-doped silicon oxide | Laxman Murugesh, Maciek Orczyk, Pravin Narawankar, Jianmin Qiao | 2001-05-08 |
| 6218300 | Method and apparatus for forming a titanium doped tantalum pentaoxide dielectric layer using CVD | Pravin K. Narwankar, Randall S. Urdahl, Ankineedu Velaga, Patricia M. Liu | 2001-04-17 |
| 6211065 | Method of depositing and amorphous fluorocarbon film using HDP-CVD | Ming Xi, Eugene Tzou, LIE CHENG, Yaxin Wang | 2001-04-03 |
| 6204203 | Post deposition treatment of dielectric films for interface control | Pravin K. Narwankar, Gregory Redinbo, Patricia M. Liu, Huyen Tran | 2001-03-20 |
| 6200911 | Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power | Pravin K. Narwankar, Sameer Desai, Walter Zygmunt, Laxman Murugesh | 2001-03-13 |
| 6136685 | High deposition rate recipe for low dielectric constant films | Pravin K. Narwankar, Laxman Murugesh, Maciek Orczyk, Jianmin Qiao | 2000-10-24 |
| 6121161 | Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions | Kent Rossman, Hichem M'Saad, Romuald Nowak | 2000-09-19 |
| 6037235 | Hydrogen anneal for curing defects of silicon/nitride interfaces of semiconductor devices | Pravin K. Narwankar, Randall S. Urdahl, Wong-Cheng Shih | 2000-03-14 |
| 5976993 | Method for reducing the intrinsic stress of high density plasma films | K. V. Ravi, Kent Rossman, Pravin K. Narwankar | 1999-11-02 |
| 5882424 | Plasma cleaning of a CVD or etch reactor using a low or mixed frequency excitation field | Brad Taylor, Charles Dornfest, Fritz Redeker | 1999-03-16 |
| 5811356 | Reduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaning | Laxman Murugesh, Pravin K. Narwankar, Kent Rossman | 1998-09-22 |