WZ

Walter Zygmunt

Applied Materials: 8 patents #1,541 of 7,310Top 25%
Overall (All Time): #656,915 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7704897 HDP-CVD SiON films for gap-fill Hemant P. Mungekar, Young S. Lee, Agnieszka Jakubowicz, Zhong Qiang Hua, Rionard Purnawan +1 more 2010-04-27
7196021 HDP-CVD deposition process for filling high aspect ratio gaps Zhengquan Tan, Dongqing Li 2007-03-27
6929700 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Zhengquan Tan, Dongqing Li, Tetsuya Ishikawa 2005-08-16
6914016 HDP-CVD deposition process for filling high aspect ratio gaps Zhengquan Tan, Dongqing Li 2005-07-05
6740601 HDP-CVD deposition process for filling high aspect ratio gaps Zhengquan Tan, Dongqing Li 2004-05-25
6596653 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Zhengquan Tan, Dongqing Li, Tetsuya Ishikawa 2003-07-22
6579811 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating Pravin K. Narwankar, Sameer Desai, Turgut Sahin, Laxman Murugesh 2003-06-17
6200911 Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power Pravin K. Narwankar, Sameer Desai, Turgut Sahin, Laxman Murugesh 2001-03-13