Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11631591 | Methods for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Jingyi Li, Douglas A. Buchberger, Jr., Srinivas D. Nemani +1 more | 2023-04-18 |
| 11289312 | Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability | Adolph Miller Allen, Vanessa Faune, Kirankumar Neelasandra SAVANDAIAH, Anantha K. Subramani, Philip Allan Kraus +5 more | 2022-03-29 |
| 11114306 | Methods for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Jingyi Li, Douglas A. Buchberger, Jr., Srinivas D. Nemani +1 more | 2021-09-07 |
| 11049701 | Biased cover ring for a substrate processing system | Adolph Miller Allen, William Johanson, Viachslav Babayan, Carl Johnson, Vanessa Faune +4 more | 2021-06-29 |
| 10858735 | Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods | Danny D. WANG, Jason Michael Lamb, Jun Tae Choi, Rupankar Choudhury, Juan Carlos Rocha-Alvarez | 2020-12-08 |
| 10858727 | High density, low stress amorphous carbon film, and process and equipment for its deposition | Jingjing Liu, Adolph Miller Allen, Michael W. Stowell, Srinivas D. Nemani, Chentsau Ying +3 more | 2020-12-08 |
| 10811257 | Techniques for forming low stress etch-resistant mask using implantation | Rajesh Prasad, Tzu-Yu Liu, Kyu-Ha Shim, Tom Ho Wing Yu, Adolph Miller Allen +3 more | 2020-10-20 |
| 10570506 | Method to improve film quality for PVD carbon with reactive gas and bias power | Bhargav S. Citla, Jingjing Liu, Chentsau Ying, Srinivas D. Nemani, Ellie Yieh | 2020-02-25 |
| 10566177 | Pulse shape controller for sputter sources | Michael W. Stowell, Viachslav Babayan, Jingjing Liu | 2020-02-18 |
| 10435786 | Alignment systems employing actuators providing relative displacement between lid assemblies of process chambers and substrates, and related methods | Danny D. WANG, Jun Tae Choi, Rupankar Choudhury, Juan Carlos Rocha-Alvarez, Jason Michael Lamb | 2019-10-08 |
| 10128337 | Methods for forming fin structures with desired profile for 3D structure semiconductor applications | Jie Zhou, Chentsau Chris Ying, Srinivas D. Nemani, Ellie Yieh | 2018-11-13 |
| 9809881 | Method and apparatus for multizone plasma generation | Matthew S. Rogers, Christopher S. Olsen | 2017-11-07 |
| 8404583 | Conformality of oxide layers along sidewalls of deep vias | Manuel A. Hernandez, Lei Luo, Kedar Sapre | 2013-03-26 |
| 8114761 | Method for doping non-planar transistors | Tushar Mandrekar, Shankar Venkataraman, Manuel A. Hernandez | 2012-02-14 |
| 7967913 | Remote plasma clean process with cycled high and low pressure clean steps | Sanjay Kamath, Young S. Lee, Ellie Yieh, Hien Minh Le, Anjana M. Patel +1 more | 2011-06-28 |
| 7789993 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Siqing Lu +4 more | 2010-09-07 |
| 7704897 | HDP-CVD SiON films for gap-fill | Hemant P. Mungekar, Young S. Lee, Agnieszka Jakubowicz, Rionard Purnawan, Sanjay Kamath +1 more | 2010-04-27 |
| 7572647 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Siqing Lu +4 more | 2009-08-11 |
| 7498268 | Gas delivery system for semiconductor processing | Sudhir Gondhalekar, Padmanabhan Krishnaraj, Tom K. Cho, Muhammad M. Rasheed, Hemant P. Mungekar +1 more | 2009-03-03 |
| 7159597 | Multistep remote plasma clean process | Zhengquan Tan, Zhuang Li, Kent Rossman | 2007-01-09 |
| 7141138 | Gas delivery system for semiconductor processing | Sudhir Gondhalekar, Padmanabhan Krishnaraj, Tom K. Cho, Muhammad M. Rasheed, Hemant P. Mungekar +1 more | 2006-11-28 |
| 7064077 | Method for high aspect ratio HDP CVD gapfill | Dong Li, Zhengquan Tan, Zhuang Li, Michael Kwan, Bruno Geoffrion +1 more | 2006-06-20 |
| 6822185 | Temperature controlled dome-coil system for high power inductively coupled plasma systems | Michael Welch, Paul Luscher, Siamak Salimian, Rolf Guenther, Son M. Phi +1 more | 2004-11-23 |
| 6812153 | Method for high aspect ratio HDP CVD gapfill | Dong Li, Zhengquan Tan, Zhuang Li, Michael Kwan, Bruno Geoffrion +1 more | 2004-11-02 |
| 6372291 | In situ deposition and integration of silicon nitride in a high density plasma reactor | Kasra Khazeni | 2002-04-16 |