Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7799698 | Deposition-selective etch-deposition process for dielectric film gapfill | Lin Zhang, Xiaolin Chen, Dongqing Li, Thanh Pham, Farhad Moghadam +1 more | 2010-09-21 |
| 7722737 | Gas distribution system for improved transient phase deposition | Sudhir Gondhalekar, Robert Duncan, Siamak Salimian, Muhammad M. Rasheed, Harry Whitesell +2 more | 2010-05-25 |
| 7691753 | Deposition-selective etch-deposition process for dielectric film gapfill | Lin Zhang, Xiaolin Chen, Dongqing Li, Thanh Pham, Farhad Moghadam +1 more | 2010-04-06 |
| 7498268 | Gas delivery system for semiconductor processing | Sudhir Gondhalekar, Tom K. Cho, Muhammad M. Rasheed, Hemant P. Mungekar, Thanh Pham +1 more | 2009-03-03 |
| 7431772 | Gas distributor having directed gas flow and cleaning method | Laxman Murugesh, Carl A. Dunham | 2008-10-07 |
| 7399388 | Sequential gas flow oxide deposition technique | Farhad Moghadam, Michael S. Cox, Thanh Pham | 2008-07-15 |
| 7399707 | In situ application of etch back for improved deposition into high-aspect-ratio features | Pavel Ionov, Canfeng Lai, Michael S. Cox, Shamouil Shamouilian | 2008-07-15 |
| 7189639 | Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applications | Michael S. Cox, Bruno Geoffrion, Srinivas D. Nemani | 2007-03-13 |
| 7141138 | Gas delivery system for semiconductor processing | Sudhir Gondhalekar, Tom K. Cho, Muhammad M. Rasheed, Hemant P. Mungekar, Thanh Pham +1 more | 2006-11-28 |
| 7097886 | Deposition process for high aspect ratio trenches | Farhad Moghadam, Michael S. Cox, Thanh Pham, Zhenjiang Cui | 2006-08-29 |
| 7081414 | Deposition-selective etch-deposition process for dielectric film gapfill | Lin Zhang, Xiaolin Chen, Dongqing Li, Thanh Pham, Farhad Moghadam +1 more | 2006-07-25 |
| 7064077 | Method for high aspect ratio HDP CVD gapfill | Zhong Qiang Hua, Dong Li, Zhengquan Tan, Zhuang Li, Michael Kwan +1 more | 2006-06-20 |
| 6890597 | HDP-CVD uniformity control | Bruno Geoffrion, Michael S. Cox, Lin Zhang, Bikram Kapoor, Anchuan Wang +1 more | 2005-05-10 |
| 6869880 | In situ application of etch back for improved deposition into high-aspect-ratio features | Pavel Ionov, Canfeng Lai, Michael S. Cox, Shamouil Shamouilian | 2005-03-22 |
| 6863019 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Shamouil Shamouilian, Canfeng Lai, Michael S. Cox, Tsutomu Tanaka, Sebastien Raoux +2 more | 2005-03-08 |
| 6812153 | Method for high aspect ratio HDP CVD gapfill | Zhong Qiang Hua, Dong Li, Zhengquan Tan, Zhuang Li, Michael Kwan +1 more | 2004-11-02 |
| 6715496 | Method and apparatus for cleaning a semiconductor wafer processing system | Michael Kwan, Alan W. Collins, Jalel Hamila, Zhengquan Tan | 2004-04-06 |
| 6635144 | Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment | Zhenjiang Cui, Shamouil Shamouilian | 2003-10-21 |
| 6633076 | Methods and apparatus for producing stable low k FSG film for HDP-CVD | Robert Duncan, Joseph D'Souza, Alan W. Collins, Nasreen Chopra, Kimberly Branshaw | 2003-10-14 |
| 6596123 | Method and apparatus for cleaning a semiconductor wafer processing system | Michael Kwan, Alan W. Collins, Jalel Hamila, Zhengquan Tan | 2003-07-22 |
| 6511922 | Methods and apparatus for producing stable low k FSG film for HDP-CVD | Robert Duncan, Joseph D'Souza, Alan W. Collins, Nasreen Chopra, Kimberly Branshaw | 2003-01-28 |
| 6486081 | Gas distribution system for a CVD processing chamber | Tetsuya Ishikawa, Feng Gao, Alan W. Collins, Lily Pang | 2002-11-26 |
| 6274058 | Remote plasma cleaning method for processing chambers | Ravi Rajagopalan, Patricia M. Liu, Pravin K. Narwankar, Huyen Tran, Alan Ablao +1 more | 2001-08-14 |
| 6189483 | Process kit | Tetsuya Ishikawa, Kaveh Niazi, Hiroji Hanawa | 2001-02-20 |
| 6175485 | Electrostatic chuck and method for fabricating the same | Brian Lue, Ramkishan Rao Lingampalli, Shun Wu | 2001-01-16 |