Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7413627 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Tetsuya Ishikawa | 2008-08-19 |
| 6833052 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Tetsuya Ishikawa | 2004-12-21 |
| 6814814 | Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates | Feng Gao, Tetsuya Ishikawa, Padmanaban Krishnaraj, Yaxin Wang | 2004-11-09 |
| 6715496 | Method and apparatus for cleaning a semiconductor wafer processing system | Michael Kwan, Jalel Hamila, Padmanabhan Krishnaraj, Zhengquan Tan | 2004-04-06 |
| 6633076 | Methods and apparatus for producing stable low k FSG film for HDP-CVD | Padmanabhan Krishnaraj, Robert Duncan, Joseph D'Souza, Nasreen Chopra, Kimberly Branshaw | 2003-10-14 |
| 6596123 | Method and apparatus for cleaning a semiconductor wafer processing system | Michael Kwan, Jalel Hamila, Padmanabhan Krishnaraj, Zhengquan Tan | 2003-07-22 |
| 6589610 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Tetsuya Ishikawa | 2003-07-08 |
| 6511922 | Methods and apparatus for producing stable low k FSG film for HDP-CVD | Padmanabhan Krishnaraj, Robert Duncan, Joseph D'Souza, Nasreen Chopra, Kimberly Branshaw | 2003-01-28 |
| 6486081 | Gas distribution system for a CVD processing chamber | Tetsuya Ishikawa, Padmanabhan Krishnaraj, Feng Gao, Lily Pang | 2002-11-26 |
| 6416823 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Tetsuya Ishikawa | 2002-07-09 |
| 6143078 | Gas distribution system for a CVD processing chamber | Tetsuya Ishikawa, Padmanabhan Krishnaraj, Feng Gao, Lily Pang | 2000-11-07 |
| 6070551 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Fred C. Redeker, Tetsuya Ishikawa | 2000-06-06 |