ZT

Zhengquan Tan

Applied Materials: 12 patents #1,120 of 7,310Top 20%
KL Kla: 5 patents #71 of 758Top 10%
KL Kla-Tencor: 5 patents #354 of 1,394Top 30%
📍 Milpitas, CA: #206 of 3,192 inventorsTop 7%
🗺 California: #25,620 of 386,348 inventorsTop 7%
Overall (All Time): #190,487 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
12379672 Metrology of nanosheet surface roughness and profile Houssam Chouaib, HaoMiao Chang, Teng Gu, Tianrong Zhan, Andrew Lagodzinski 2025-08-05
11796390 Bandgap measurements of patterned film stacks using spectroscopic metrology Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen +8 more 2023-10-24
11573077 Scatterometry based methods and systems for measurement of strain in semiconductor structures Houssam Chouaib, Aaron Rosenberg, Kai-Hsiang Lin, Dawei Hu 2023-02-07
11555689 Measuring thin films on grating and bandgap on grating Houssam Chouaib 2023-01-17
11378451 Bandgap measurements of patterned film stacks using spectroscopic metrology Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen +8 more 2022-07-05
11060846 Scatterometry based methods and systems for measurement of strain in semiconductor structures Houssam Chouaib, Aaron Rosenberg, Kai-Hsiang Lin, Dawei Hu 2021-07-13
10663286 Measuring thin films on grating and bandgap on grating Houssam Chouaib 2020-05-26
10458912 Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity Houssam Chouaib, Qiang Zhao, Andrei V. Shchegrov 2019-10-29
10013518 Model building and analysis engine for combined X-ray and optical metrology Michael S. Bakeman, Andrei V. Shchegrov, Qiang Zhao 2018-07-03
7349079 Methods for measurement or analysis of a nitrogen concentration of a specimen Qiang Zhao, Torsten R. Kaack, Sungchul Yoo 2008-03-25
7196021 HDP-CVD deposition process for filling high aspect ratio gaps Dongqing Li, Walter Zygmunt 2007-03-27
7159597 Multistep remote plasma clean process Zhong Qiang Hua, Zhuang Li, Kent Rossman 2007-01-09
7064077 Method for high aspect ratio HDP CVD gapfill Zhong Qiang Hua, Dong Li, Zhuang Li, Michael Kwan, Bruno Geoffrion +1 more 2006-06-20
6929700 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Dongqing Li, Walter Zygmunt, Tetsuya Ishikawa 2005-08-16
6914016 HDP-CVD deposition process for filling high aspect ratio gaps Dongqing Li, Walter Zygmunt 2005-07-05
6812153 Method for high aspect ratio HDP CVD gapfill Zhong Qiang Hua, Dong Li, Zhuang Li, Michael Kwan, Bruno Geoffrion +1 more 2004-11-02
6740601 HDP-CVD deposition process for filling high aspect ratio gaps Dongqing Li, Walter Zygmunt 2004-05-25
6715496 Method and apparatus for cleaning a semiconductor wafer processing system Michael Kwan, Alan W. Collins, Jalel Hamila, Padmanabhan Krishnaraj 2004-04-06
6682603 Substrate support with extended radio frequency electrode upper surface Sudhir Gondhalekar, Dongqing Li, Canfeng Lai, Steve Kim, Alexander Veyster 2004-01-27
6596123 Method and apparatus for cleaning a semiconductor wafer processing system Michael Kwan, Alan W. Collins, Jalel Hamila, Padmanabhan Krishnaraj 2003-07-22
6596653 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Dongqing Li, Walter Zygmunt, Tetsuya Ishikawa 2003-07-22
6423384 HDP-CVD deposition of low dielectric constant amorphous carbon film Kasra Khazeni, Eugene Tzou 2002-07-23