Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12142459 | Single chamber flowable film formation and treatments | Khokan Chandra Paul, Adam J. Fischbach, Tsutomu Tanaka | 2024-11-12 |
| 12020965 | Magnetic holding structures for plasma processing applications | Andrew Nguyen, Sathya Swaroop Ganta, Kallol Bera | 2024-06-25 |
| 11984302 | Magnetic-material shield around plasma chambers near pedestal | Job George Konnoth Joseph, Sathya Swaroop Ganta, Kallol Bera, Andrew Nguyen, Jay D. Pinson, II +6 more | 2024-05-14 |
| 11699571 | Semiconductor processing chambers for deposition and etch | Khokan Chandra Paul, Ravikumar Patil, Vijet Patil, Carlaton WONG, Adam J. Fischbach +2 more | 2023-07-11 |
| 11581408 | Method and apparatus for selective nitridation process | Matthew S. Rogers, Roger Curtis, Lara Hawrylchak, Bernard L. Hwang, Jeffrey Tobin +2 more | 2023-02-14 |
| 11450509 | Inductive plasma source with metallic shower head using b-field concentrator | Jeffrey Tobin, Peter I. Porshnev, Jose Antonio Marin | 2022-09-20 |
| D946534 | Radio frequency conduit | Adam J. Fischbach, Kien N. Chuc, Carlaton WONG | 2022-03-22 |
| 10950698 | Method and apparatus for selective nitridation process | Matthew S. Rogers, Roger Curtis, Lara Hawrylchak, Bernard L. Hwang, Jeffrey Tobin +2 more | 2021-03-16 |
| 10699878 | Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring | James Eugene Caron, Ivelin Angelov, Jason Lee Treadwell, Joon Hong Park | 2020-06-30 |
| 10529541 | Inductive plasma source with metallic shower head using B-field concentrator | Jeffrey Tobin, Peter I. Porshnev, Jose Antonio Marin | 2020-01-07 |
| 9048190 | Methods and apparatus for processing substrates using an ion shield | Jeffrey Tobin, Bernard L. Hwang, Lara Hawrylchak, Wei Liu, Johanes F. Swenberg | 2015-06-02 |
| 8317970 | Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma | Lily Pang, Majeed A. Foad | 2012-11-27 |
| 8003500 | Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking | Manoj Vellaikal, Kartik Santhanam, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle +2 more | 2011-08-23 |
| 7789993 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua, Siqing Lu +4 more | 2010-09-07 |
| 7659184 | Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking | Manoj Vellaikal, Kartik Santhanam, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle +2 more | 2010-02-09 |
| 7651587 | Two-piece dome with separate RF coils for inductively coupled plasma reactors | Siqing Lu, Qiwei Liang, Robert Chen, Jason Bloking, Irene Chou +3 more | 2010-01-26 |
| 7588036 | Chamber clean method using remote and in situ plasma cleaning systems | Zhenjiang Cui, Michael S. Cox, Paddy Krishnaraj | 2009-09-15 |
| 7571698 | Low-frequency bias power in HDP-CVD processes | Rongping Wang, Yuri Trachuk, Siamak Salimian | 2009-08-11 |
| 7572647 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua, Siqing Lu +4 more | 2009-08-11 |
| 7399707 | In situ application of etch back for improved deposition into high-aspect-ratio features | Padmanabhan Krishnaraj, Pavel Ionov, Michael S. Cox, Shamouil Shamouilian | 2008-07-15 |
| 7363876 | Multi-core transformer plasma source | Michael S. Cox, Peter Loewenhardt, Tsutomu Tanaka, Shamouil Shamouilian | 2008-04-29 |
| 6894474 | Non-intrusive plasma probe | Michael S. Cox, Qiwei Liang | 2005-05-17 |
| 6869880 | In situ application of etch back for improved deposition into high-aspect-ratio features | Padmanabhan Krishnaraj, Pavel Ionov, Michael S. Cox, Shamouil Shamouilian | 2005-03-22 |
| 6863019 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Shamouil Shamouilian, Michael S. Cox, Padmanabhan Krishnaraj, Tsutomu Tanaka, Sebastien Raoux +2 more | 2005-03-08 |
| 6841006 | Atmospheric substrate processing apparatus for depositing multiple layers on a substrate | Michael Barnes, Michael S. Cox, John Parks | 2005-01-11 |