Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11530156 | Method for preparing all-solid-state photonic crystal fiber preforms by extrusion | Xunsi Wang, Youren Dong, Shixun Dai, Qiuhua Nie, Xiange Wang +4 more | 2022-12-20 |
| 11398369 | Method and apparatus for actively tuning a plasma power source | Siamak Salimian, Tom K. Cho | 2022-07-26 |
| 11355325 | Methods and systems for monitoring input power for process control in semiconductor process systems | Ramesh Gopalan, Hemant P. Mungekar, Guomin Mao, Teryl Pratt | 2022-06-07 |
| 11328900 | Plasma ignition circuit | Teryl Pratt, Guomin Mao, Andy Chuang | 2022-05-10 |
| 10757797 | Method and apparatus for gas abatement | Jibing Zeng, David Muquing HOU, Michael S. Cox, Zheng Yuan, James L'HEUREUX | 2020-08-25 |
| 10580626 | Arcing detection apparatus for plasma processing | Lin Zhang, Jian J. Chen, Michael S. Cox, Andrew V. LE | 2020-03-03 |
| 10211030 | Source RF power split inner coil to improve BCD and etch depth performance | Ruizhe Ren, Jon C. Farr, Chethan Mangalore, Peter DEMONTE, Parthiban Balakrishna | 2019-02-19 |
| 10187966 | Method and apparatus for gas abatement | Jibing Zeng, David Muquing HOU, Michael S. Cox, Zheng Yuan, James L'HEUREUX | 2019-01-22 |
| 10176973 | Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system | Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson | 2019-01-08 |
| 9767990 | Apparatus for treating a gas in a conduit | Jibing Zeng, Brian T. West, Manoj A. Gajendra | 2017-09-19 |
| 9659757 | Measuring and controlling wafer potential in pulsed RF bias processing | Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Tuan Ngo | 2017-05-23 |
| 9552967 | Abatement system having a plasma source | Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson | 2017-01-24 |
| 9543124 | Capacitively coupled plasma source for abating compounds produced in semiconductor processes | Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson | 2017-01-10 |
| 9378928 | Apparatus for treating a gas in a conduit | Jibing Zeng, Brian T. West, Manoj A. Gajendra | 2016-06-28 |
| 9240308 | Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system | Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson | 2016-01-19 |
| 9230780 | Hall effect enhanced capacitively coupled plasma source | Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson | 2016-01-05 |
| 8753989 | Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure | Mihaela Balseanu, Michael S. Cox, Li-Qun Xia, Mei-Yee Shek, Jia-Sheng Lee +4 more | 2014-06-17 |
| 8728918 | Method and apparatus for fabricating silicon heterojunction solar cells | Shuran Sheng, Lin Zhang, Zheng Yuan, Alan Tso | 2014-05-20 |
| 8303763 | Measuring and controlling wafer potential in pulsed RF bias processing | Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Tuan Ngo | 2012-11-06 |
| 8192576 | Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing | Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Tuan Ngo | 2012-06-05 |
| 8129290 | Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure | Mihaela Balseanu, Michael S. Cox, Li-Qun Xia, Mei-Yee Shek, Jia-Sheng Lee +4 more | 2012-03-06 |
| 7571698 | Low-frequency bias power in HDP-CVD processes | Canfeng Lai, Yuri Trachuk, Siamak Salimian | 2009-08-11 |