| 11530156 |
Method for preparing all-solid-state photonic crystal fiber preforms by extrusion |
Xunsi Wang, Youren Dong, Shixun Dai, Qiuhua Nie, Xiange Wang +4 more |
2022-12-20 |
|
| 11398369 |
Method and apparatus for actively tuning a plasma power source |
Siamak Salimian, Tom K. Cho |
2022-07-26 |
$63,545,000 |
| 11355325 |
Methods and systems for monitoring input power for process control in semiconductor process systems |
Ramesh Gopalan, Hemant P. Mungekar, Guomin Mao, Teryl Pratt |
2022-06-07 |
$46,649,000 |
| 11328900 |
Plasma ignition circuit |
Teryl Pratt, Guomin Mao, Andy Chuang |
2022-05-10 |
$45,778,000 |
| 10757797 |
Method and apparatus for gas abatement |
Jibing Zeng, David Muquing HOU, Michael S. Cox, Zheng Yuan, James L'HEUREUX |
2020-08-25 |
$29,525,000 |
| 10580626 |
Arcing detection apparatus for plasma processing |
Lin Zhang, Jian J. Chen, Michael S. Cox, Andrew V. LE |
2020-03-03 |
$21,905,000 |
| 10211030 |
Source RF power split inner coil to improve BCD and etch depth performance |
Ruizhe Ren, Jon C. Farr, Chethan Mangalore, Peter DEMONTE, Parthiban Balakrishna |
2019-02-19 |
$29,015,000 |
| 10187966 |
Method and apparatus for gas abatement |
Jibing Zeng, David Muquing HOU, Michael S. Cox, Zheng Yuan, James L'HEUREUX |
2019-01-22 |
$28,931,000 |
| 10176973 |
Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system |
Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2019-01-08 |
$16,165,000 |
| 9767990 |
Apparatus for treating a gas in a conduit |
Jibing Zeng, Brian T. West, Manoj A. Gajendra |
2017-09-19 |
$15,798,000 |
| 9659757 |
Measuring and controlling wafer potential in pulsed RF bias processing |
Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Tuan Ngo |
2017-05-23 |
$39,116,000 |
| 9552967 |
Abatement system having a plasma source |
Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2017-01-24 |
$20,961,000 |
| 9543124 |
Capacitively coupled plasma source for abating compounds produced in semiconductor processes |
Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2017-01-10 |
$27,103,000 |
| 9378928 |
Apparatus for treating a gas in a conduit |
Jibing Zeng, Brian T. West, Manoj A. Gajendra |
2016-06-28 |
$9,817,000 |
| 9240308 |
Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system |
Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2016-01-19 |
$15,148,000 |
| 9230780 |
Hall effect enhanced capacitively coupled plasma source |
Michael S. Cox, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2016-01-05 |
$12,358,000 |
| 8753989 |
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure |
Mihaela Balseanu, Michael S. Cox, Li-Qun Xia, Mei-Yee Shek, Jia-Sheng Lee +4 more |
2014-06-17 |
$19,996,000 |
| 8728918 |
Method and apparatus for fabricating silicon heterojunction solar cells |
Shuran Sheng, Lin Zhang, Zheng Yuan, Alan Tso |
2014-05-20 |
$31,018,000 |
| 8303763 |
Measuring and controlling wafer potential in pulsed RF bias processing |
Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Tuan Ngo |
2012-11-06 |
$18,496,000 |
| 8192576 |
Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing |
Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Tuan Ngo |
2012-06-05 |
$27,452,000 |
| 8129290 |
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure |
Mihaela Balseanu, Michael S. Cox, Li-Qun Xia, Mei-Yee Shek, Jia-Sheng Lee +4 more |
2012-03-06 |
$9,163,000 |
| 7571698 |
Low-frequency bias power in HDP-CVD processes |
Canfeng Lai, Yuri Trachuk, Siamak Salimian |
2009-08-11 |
$21,048,000 |
