Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9659757 | Measuring and controlling wafer potential in pulsed RF bias processing | Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Rongping Wang | 2017-05-23 |
| 8303763 | Measuring and controlling wafer potential in pulsed RF bias processing | Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Rongping Wang | 2012-11-06 |
| 8192576 | Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing | Andras Kuthi, Stephen Hwang, James C. Vetter, Greg Eilenstine, Rongping Wang | 2012-06-05 |
| 6622286 | Integrated electronic hardware for wafer processing control and diagnostic | Farro Kaveh, Connie Lam, Chung-Ho Huang, Tuqiang Ni, Anthony Le +1 more | 2003-09-16 |
| 6526355 | Integrated full wavelength spectrometer for wafer processing | Tuqiang Ni, Chung-Ho Huang, Andrew Lui, Farro Kaveh | 2003-02-25 |
| 6361645 | Method and device for compensating wafer bias in a plasma processing chamber | Alan M. Schoepp, Robert Knop, Christopher H. Olson, Michael Barnes | 2002-03-26 |
| 6060837 | Method of and apparatus for minimizing plasma instability in an rf processor | Brett C. Richardson | 2000-05-09 |
| 5982099 | Method of and apparatus for igniting a plasma in an r.f. plasma processor | Michael Barnes, Brett C. Richardson, John Holland | 1999-11-09 |
| 5929717 | Method of and apparatus for minimizing plasma instability in an RF processor | Brett C. Richardson | 1999-07-27 |
| 5689215 | Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor | Brett C. Richardson, Michael Barnes | 1997-11-18 |
| 4507078 | Wafer handling apparatus and method | Johann Tam, Jalal Ashjaee, Nobuo Kuwaki, Susan W. Kung | 1985-03-26 |