Issued Patents All Time
Showing 1–25 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12341037 | Temperature control apparatus for semiconductor processing equipment, and temperature control method for the same | Kui Zhao, Hiroshi Iizuka, Dee H. Wu, Rason Zuo | 2025-06-24 |
| 12309891 | Control method for multi-zone active-matrix temperature control in plasma processing apparatus | Rason Zuo, Dee H. Wu, Sha Rin | 2025-05-20 |
| 12261012 | Plasma treatment apparatus, lower electrode assembly and forming method thereof | Sheng Guo, Xiang Sun, Guangwei Fan, Kuan-Yu Yang, Hongqing V. Wang +2 more | 2025-03-25 |
| 12094695 | Multi-zone temperature control plasma reactor | Steven Lee, Sha Rin, Zhou Xiaofeng, Mei Rui | 2024-09-17 |
| 12062524 | Plasma reactor having a variable coupling of low frequency RF power to an annular electrode | Kui Zhao, Shenjian Liu | 2024-08-13 |
| 11682541 | Radio frequency power supply system, plasma processor, and frequency-tuning matching | Lei Xu, Leyi Tu | 2023-06-20 |
| 11676803 | Liner assembly for vacuum treatment apparatus, and vacuum treatment apparatus | Rason Zuo | 2023-06-13 |
| 11670515 | Capacitively coupled plasma etching apparatus | Yunwen Huang, Jie Liang, Jinlong Zhao, Lei Wu | 2023-06-06 |
| 11626314 | Lift pin assembly, an electrostatic chuck and a processing apparatus where the electrostatic chuck is located | Rubin Ye, Manus Wong, Jie Liang, Leyi Tu, Ziyang Wu | 2023-04-11 |
| 11545342 | Plasma processor and processing method | Leyi Tu | 2023-01-03 |
| 11515168 | Capacitively coupled plasma etching apparatus | Yunwen Huang, Jie Liang, Jinlong Zhao | 2022-11-29 |
| 11387084 | Uniform pumping dual-station vacuum processor | Yuejun GONG, Rason Zuo, Dee H. Wu, Ning Zhou, Kelvin Chen | 2022-07-12 |
| 11373843 | Capacitively coupled plasma etching apparatus | Yunwen Huang, Jie Liang, Jinlong Zhao, Lei Wu | 2022-06-28 |
| 11371141 | Plasma process apparatus with low particle contamination and method of operating the same | Rason Zuo, Shenjian Liu, Xingjian CHEN, Lei Wan | 2022-06-28 |
| 11363680 | Plasma reactor and heating apparatus therefor | Kui Zhao, Dee H. Wu | 2022-06-14 |
| 11348763 | Corrosion-resistant structure for a gas delivery system in a plasma processing apparatus | Zengdi Lian, Rason Zuo, Dee H. Wu, Yu Guan, Xingjian CHEN +1 more | 2022-05-31 |
| 11309165 | Gas showerhead, manufacturing method, and plasma apparatus including the gas showerhead | Zhaoyang Xu, Jiawei Jiang | 2022-04-19 |
| 11189496 | Plasma reactor for ultra-high aspect ratio etching and etching method thereof | Gerald Yin, Yichuan Zhang, Jie Liang, Xingcai Su | 2021-11-30 |
| 10685811 | Switchable matching network and an inductively coupled plasma processing apparatus having such network | Kui Zhao, Hiroshi Iizuka, Xiaobei Pang | 2020-06-16 |
| 10685814 | Processing chamber, combination of processing chamber and loadlock, and system for processing substrates | Heng Tao, Qian Wang | 2020-06-16 |
| 10529577 | Device of changing gas flow pattern and a wafer processing method and apparatus | Zhilin Huang | 2020-01-07 |
| 10187965 | Plasma confinement apparatus, and method for confining a plasma | Jinyuan Chen, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou +1 more | 2019-01-22 |
| 9633884 | Performance enhancement of coating packaged ESC for semiconductor apparatus | Xiaoming He | 2017-04-25 |
| 9431216 | ICP source design for plasma uniformity and efficiency enhancement | Songlin Xu, Gang Shi | 2016-08-30 |
| 9275870 | Plasma processing method and plasma processing device | Lei Xu, Zhaohui Xi | 2016-03-01 |