Issued Patents All Time
Showing 26–50 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9208998 | Multi-station decoupled reactive ion etch chamber | Gerald Yin, Jinyuan Chen, Xueyu Qian | 2015-12-08 |
| 9190302 | System and method for controlling plasma with an adjustable coupling to ground circuit | Wenli Collison | 2015-11-17 |
| 9095038 | ICP source design for plasma uniformity and efficiency enhancement | Shi Gang, Songlin Xu | 2015-07-28 |
| 8518211 | System and method for controlling plasma with an adjustable coupling to ground circuit | Wenli Collison | 2013-08-27 |
| 8480913 | Plasma processing method and apparatus with control of plasma excitation power | Weinan Jiang, Frank Y. Lin, Chung-Ho Huang | 2013-07-09 |
| 8366829 | Multi-station decoupled reactive ion etch chamber | Gerald Yin, Jinyuan Chen, Xueyu Qian | 2013-02-05 |
| 8336488 | Multi-station plasma reactor with multiple plasma regions | Aihua Chen, Yijun Liu, Jinyuan Chen, Lee Luo, Gerald Yin +1 more | 2012-12-25 |
| 8297225 | Capacitive CVD reactor and methods for plasma CVD process | Gerald Yin, Jinyuan Chen | 2012-10-30 |
| 8114246 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Wenli Collison, David Hemker, Lumin Li | 2012-02-14 |
| 8111499 | System and method of sensing and removing residual charge from a processed wafer | Jinyuan Chen, Ye Wang, Ruoxin Du, Liang Ouyang | 2012-02-07 |
| 8025731 | Gas injection system for plasma processing | Alex Demos | 2011-09-27 |
| 7992518 | Silicon carbide gas distribution plate and RF electrode for plasma etch chamber | Robert Wu | 2011-08-09 |
| 7785417 | Gas injection system for plasma processing | Alex Demos | 2010-08-31 |
| 7503996 | Multiple frequency plasma chamber, switchable RF system, and processes using same | Jinyuan Chen, Gerald Yin, Xueyu Qian, Hiroshi Iizuka | 2009-03-17 |
| 7105102 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Wenli Collison, David Hemker, Lumin Li | 2006-09-12 |
| 7077971 | Methods for detecting the endpoint of a photoresist stripping process | Wenli Collison | 2006-07-18 |
| 7009281 | Small volume process chamber with hot inner surfaces | Andrew D. Bailey, III | 2006-03-07 |
| 6897156 | Vacuum plasma processor method | Kenji Takeshita, Tom Choi, Frank Y. Lin | 2005-05-24 |
| 6855567 | Etch endpoint detection | Andrew Lui, Chung-Ho Huang, Weinan Jiang | 2005-02-15 |
| 6746961 | Plasma etching of dielectric layer with etch profile control | Lumin Li | 2004-06-08 |
| 6716303 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Wenli Collison, David Hemker, Lumin Li | 2004-04-06 |
| 6709547 | Moveable barrier for multiple etch processes | Kenji Takeshita, Brian McMillin | 2004-03-23 |
| 6692649 | Inductively coupled plasma downstream strip module | Wenli Collison, Michael Barnes, Butch Berney, Wayne Vereb, Brian McMillin | 2004-02-17 |
| 6622286 | Integrated electronic hardware for wafer processing control and diagnostic | Tuan Ngo, Farro Kaveh, Connie Lam, Chung-Ho Huang, Anthony Le +1 more | 2003-09-16 |
| 6617257 | Method of plasma etching organic antireflective coating | Weinan Jiang, Conan Chiang, Frank Y. Lin, Chris Lee, Dai N. Lee | 2003-09-09 |