Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10794519 | Additively manufactured gas distribution manifold | Christopher W. Burkhart, Andrew C. Lee | 2020-10-06 |
| 10747210 | System and method for automating user interaction for semiconductor manufacturing equipment | Rainer Unterguggenberger, Henry T. Chan, Chung-Ho Huang, Vincent Wong | 2020-08-18 |
| 10215317 | Additively manufactured gas distribution manifold | Christopher W. Burkhart, Andrew C. Lee | 2019-02-26 |
| 9871759 | Social network service for semiconductor manufacturing equipment and users | Chung-Ho Huang, Henry T. Chan, Chad R. Weetman | 2018-01-16 |
| 9431268 | Isotropic atomic layer etch for silicon and germanium oxides | Thorsten Lill, Ivan L. Berry, III, Meihua Shen, Alan M. Schoepp | 2016-08-30 |
| 9117860 | Controlled ambient system for interface engineering | John M. Boyd, Yezdi Dordi, Tiruchirapalli Arunagiri, Benjamin W. Mooring, John Parks +7 more | 2015-08-25 |
| 9076844 | Process integration scheme to lower overall dielectric constant in BEoL interconnect structures | Nicolas Bright, Fritz Redeker, Yezdi Dordi | 2015-07-07 |
| 8114246 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Tuqiang Ni, Wenli Collison, Lumin Li | 2012-02-14 |
| 7749689 | Methods for providing a confined liquid for immersion lithography | Fred C. Redeker, John M. Boyd, John M. de Larios, Michael Ravkin, Mikhail Korolik | 2010-07-06 |
| 7520284 | Apparatus for developing photoresist and method for operating the same | John M. Boyd, Fritz Redeker | 2009-04-21 |
| 7367345 | Apparatus and method for providing a confined liquid for immersion lithography | Fred C. Redeker, John M. Boyd, John M. de Larios, Michael Ravkin, Mikhail Korolik | 2008-05-06 |
| 7356580 | Plug and play sensor integration for a process module | Chung-Ho Huang, Andrew Lui | 2008-04-08 |
| 7309618 | Method and apparatus for real time metal film thickness measurement | Yehiel Gotkis, Rodney Kistler, Aleksander Owczarz, Nicolas Bright | 2007-12-18 |
| 7105102 | Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same | Tuqiang Ni, Wenli Collison, Lumin Li | 2006-09-12 |
| 7084621 | Enhancement of eddy current based measurement capabilities | Yehiel Gotkis, Rodney Kistler, Aleksander Owczarz, Nicolas Bright | 2006-08-01 |
| 7045019 | Method for performing site-specific backside particle and contamination removal | John M. Boyd | 2006-05-16 |
| 7029368 | Apparatus for controlling wafer temperature in chemical mechanical polishing | Nicolas Bright | 2006-04-18 |
| 7010468 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Yehiel Gotkis, Vladimir Katz, Rodney Kistler, Nicolas Bright | 2006-03-07 |
| 6984162 | Apparatus methods for controlling wafer temperature in chemical mechanical polishing | Nicolas Bright | 2006-01-10 |
| 6951624 | Method and apparatus of arrayed sensors for metrological control | Yehiel Gotkis, Rodney Kistler, Aleksander Owczarz, Nicolas Bright | 2005-10-04 |
| 6939796 | System, method and apparatus for improved global dual-damascene planarization | Shrikant Lohokare, Andrew D. Bailey, III, Joel M. Cook | 2005-09-06 |
| 6937915 | Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | Rodney Kistler, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel, Damon Vincent Williams | 2005-08-30 |
| 6929531 | System and method for metal residue detection and mapping within a multi-step sequence | Yehiel Gotkis, Aleksander Owczarz, Nicolas Bright, Rodney Kistler | 2005-08-16 |
| 6925348 | Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | Rodney Kistler, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel, Damon Vincent Williams | 2005-08-02 |
| 6922053 | Complementary sensors metrological process and method and apparatus for implementing the same | Yehiel Gotkis, Rodney Kistler, Aleksander Owczarz, Nicolas Bright | 2005-07-26 |