Issued Patents All Time
Showing 1–25 of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12315739 | Isotropic silicon nitride removal | Paul Edward Gee, Wei Ying Doreen Yong, Tuck Foong Koh, John Sudijono, Philip Allan Kraus +1 more | 2025-05-27 |
| 10593553 | Germanium etching systems and methods | Nitin K. Ingle, Dimitri Kioussis | 2020-03-17 |
| 10204796 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Nitin K. Ingle, Anchuan Wang, Zihui Li | 2019-02-12 |
| 10177227 | Method for fabricating junctions and spacers for horizontal gate all around devices | Naomi Yoshida, Lin Dong, Shiyu Sun, Myungsun Kim, Nam Sung Kim +3 more | 2019-01-08 |
| 10043684 | Self-limiting atomic thermal etching systems and methods | Ranga Rao Arnepalli, Prerna Goradia, Robert Jan Visser, Nitin K. Ingle, Jayeeta Biswas +1 more | 2018-08-07 |
| 10043674 | Germanium etching systems and methods | Nitin K. Ingle, Dimitri Kioussis | 2018-08-07 |
| 9875907 | Self-aligned shielding of silicon oxide | Fei Wang, Nitin K. Ingle, Anchuan Wang, Robert Jan Visser | 2018-01-23 |
| 9859128 | Self-aligned shielding of silicon oxide | Fei Wang, Nitin K. Ingle, Anchuan Wang, Robert Jan Visser | 2018-01-02 |
| 9831097 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Nitin K. Ingle, Anchuan Wang, Zihui Li | 2017-11-28 |
| 9576809 | Etch suppression with germanium | Nitin K. Ingle, Jingchun Zhang, Anchuan Wang, Jie Liu | 2017-02-21 |
| 9478434 | Chlorine-based hardmask removal | Xikun Wang, Mandar B. Pandit, Zhenjiang Cui, Anchuan Wang, Nitin K. Ingle +1 more | 2016-10-25 |
| 9449843 | Selectively etching metals and metal nitrides conformally | Nitin K. Ingle, David Thompson, Jeffrey W. Anthis, David Knapp, Benjamin Schmiege | 2016-09-20 |
| 9359673 | Apparatus and method for atomic layer deposition | Hyungsuk Alexander Yoon, Fritz Redeker, John M. Boyd, Yezdi Dordi | 2016-06-07 |
| 9355863 | Non-local plasma oxide etch | Zhijun Chen, Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2016-05-31 |
| 9355862 | Fluorine-based hardmask removal | Mandar B. Pandit, Xikun Wang, Zhenjiang Cui, Anchuan Wang, Nitin K. Ingle | 2016-05-31 |
| 9275834 | Selective titanium nitride etch | Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2016-03-01 |
| 9236265 | Silicon germanium processing | Nitin K. Ingle, Anchuan Wang, Jingjing Xu | 2016-01-12 |
| 9111877 | Non-local plasma oxide etch | Zhijun Chen, Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2015-08-18 |
| 8951429 | Tungsten oxide processing | Jie Liu, Xikun Wang, Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2015-02-10 |
| 8716210 | Material for cleaning a substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2014-05-06 |
| 8691027 | Method for removing material from semiconductor wafer and apparatus for performing the same | Michael Ravkin, John M. de Larios, Fritz Redeker, John M. Boyd | 2014-04-08 |
| 8671959 | Method and apparatus for cleaning a substrate using non-newtonian fluids | John M. de Larios, Mike Ravkin, Jeffrey Farber, Fred C. Redeker | 2014-03-18 |
| 8623456 | Methods for atomic layer deposition | Hyungsuk Alexander Yoon, Fritz Redeker, John M. Boyd, Yezdi Dordi | 2014-01-07 |
| 8608859 | Method for removing contamination from a substrate and for making a cleaning solution | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Michael Ravkin, Fred C. Redeker | 2013-12-17 |
| 8590550 | Apparatus for cleaning contaminants from substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mike Ravkin, Fritz Redeker | 2013-11-26 |