Issued Patents All Time
Showing 25 most recent of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10861719 | Method and apparatus for processing wafer-shaped articles | David Mui, Butch Berney, Alois Goller | 2020-12-08 |
| 10446416 | Method and apparatus for processing wafer-shaped articles | David Mui, Nathan Musselwhite | 2019-10-15 |
| 8716210 | Material for cleaning a substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2014-05-06 |
| 8691027 | Method for removing material from semiconductor wafer and apparatus for performing the same | Mikhail Korolik, John M. de Larios, Fritz Redeker, John M. Boyd | 2014-04-08 |
| 8608859 | Method for removing contamination from a substrate and for making a cleaning solution | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2013-12-17 |
| 8591662 | Methods for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2013-11-26 |
| 8555903 | Method and apparatus for removing contamination from substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker +2 more | 2013-10-15 |
| 8522799 | Apparatus and system for cleaning a substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker +2 more | 2013-09-03 |
| 8522801 | Method and apparatus for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2013-09-03 |
| 8480810 | Method and apparatus for particle removal | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fritz Redeker | 2013-07-09 |
| 8475599 | Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions | Erik M. Freer, John M. de Larios, Mikhail Korolik, Katrina Mikhaylichenko, Fritz Redeker | 2013-07-02 |
| 8388762 | Substrate cleaning technique employing multi-phase solution | Erik M. Freer, John deLarios, Mikhail Korolik, Fritz Redeker | 2013-03-05 |
| 8323420 | Method for removing material from semiconductor wafer and apparatus for performing the same | Mikhail Korolik, John deLarios, Fritz Redeker, John M. Boyd | 2012-12-04 |
| 8316866 | Method and apparatus for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2012-11-27 |
| 8236382 | Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same | John M. de Larios, Mikhail Korolik, Michael G. R. Smith, Carl Woods | 2012-08-07 |
| 8137474 | Cleaning compound and method and system for using the cleaning compound | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2012-03-20 |
| 8011116 | Substrate proximity drying using in-situ local heating of substrate | Katrina Mikhaylichenko, Kenneth C. Dodge, Mikhail Korolik, John M. de Larios, Fritz Redeker | 2011-09-06 |
| 7975708 | Proximity head with angled vacuum conduit system, apparatus and method | John M. de Larios, Fred C. Redeker, Mikhail Korolik, Erik M. Freer | 2011-07-12 |
| 7862662 | Method and material for cleaning a substrate | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2011-01-04 |
| 7806126 | Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same | Katrina Mikhaylichenko, Kenneth C. Dodge, Mikhail Korolik, John M. de Larios, Fritz Redeker | 2010-10-05 |
| 7749689 | Methods for providing a confined liquid for immersion lithography | David Hemker, Fred C. Redeker, John M. Boyd, John M. de Larios, Mikhail Korolik | 2010-07-06 |
| 7743449 | System and method for a combined contact and non-contact wafer cleaning module | Katrina Mikhaylichenko, John deLarios | 2010-06-29 |
| 7737097 | Method for removing contamination from a substrate and for making a cleaning solution | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2010-06-15 |
| 7696141 | Cleaning compound and method and system for using the cleaning compound | Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Mikhail Korolik, Fred C. Redeker | 2010-04-13 |
| 7648616 | Apparatus and method for semiconductor wafer electroplanarization | John M. Boyd, Fritz Redeker, Yezdi Dordi, Robert A. Maraschin | 2010-01-19 |