Issued Patents All Time
Showing 25 most recent of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8757177 | Multi-stage substrate cleaning method and apparatus | Arnold Kholodenko, Cheng-Yu Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi | 2014-06-24 |
| 8716210 | Material for cleaning a substrate | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2014-05-06 |
| 8652266 | Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications | Yizhak Sabba, Dragan Podlesnik | 2014-02-18 |
| 8617993 | Method of reducing pattern collapse in high aspect ratio nanostructures | Amir A. Yasseri, Ji Zhu, Seokmin Yun, David Mui | 2013-12-31 |
| 8608859 | Method for removing contamination from a substrate and for making a cleaning solution | Erik M. Freer, John deLarios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2013-12-17 |
| 8590550 | Apparatus for cleaning contaminants from substrate | Mikhail Korolik, Erik M. Freer, John M. de Larios, Mike Ravkin, Fritz Redeker | 2013-11-26 |
| 8591662 | Methods for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2013-11-26 |
| 8555903 | Method and apparatus for removing contamination from substrate | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker +2 more | 2013-10-15 |
| 8522799 | Apparatus and system for cleaning a substrate | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker +2 more | 2013-09-03 |
| 8522801 | Method and apparatus for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2013-09-03 |
| 8480810 | Method and apparatus for particle removal | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fritz Redeker | 2013-07-09 |
| 8475599 | Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fritz Redeker | 2013-07-02 |
| 8440573 | Method and apparatus for pattern collapse free wet processing of semiconductor devices | Denis Syomin, Qian Fu, Glenn W. Gale, Shenjian Liu, Mark Wilcoxson | 2013-05-14 |
| 8367594 | Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particles | — | 2013-02-05 |
| 8324114 | Method and apparatus for silicon oxide residue removal | Denis Syomin | 2012-12-04 |
| 8316866 | Method and apparatus for cleaning a semiconductor substrate | Erik M. Freer, John deLarios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2012-11-27 |
| 8317934 | Multi-stage substrate cleaning method and apparatus | Arnold Kholodenko, Cheng-Yu Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi | 2012-11-27 |
| 8242067 | Two-phase substrate cleaning material | Mikhail Korolik, Erik M. Freer, John M. de Larios, Mike Ravkin, Fritz Redeker | 2012-08-14 |
| 8137474 | Cleaning compound and method and system for using the cleaning compound | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2012-03-20 |
| 8102014 | Proximity head heating method and apparatus | John deLarios | 2012-01-24 |
| 8062471 | Proximity head heating method and apparatus | John deLarios | 2011-11-22 |
| 8011116 | Substrate proximity drying using in-situ local heating of substrate | Kenneth C. Dodge, Mikhail Korolik, Michael Ravkin, John M. de Larios, Fritz Redeker | 2011-09-06 |
| 7897213 | Methods for contained chemical surface treatment | Mike Ravkin, Fritz Redeker, John M. de Larios, Erik M. Freer, Mikhail Korolik | 2011-03-01 |
| 7862662 | Method and material for cleaning a substrate | Erik M. Freer, John M. de Larios, Michael Ravkin, Mikhail Korolik, Fred C. Redeker | 2011-01-04 |
| 7806126 | Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same | Kenneth C. Dodge, Mikhail Korolik, Michael Ravkin, John M. de Larios, Fritz Redeker | 2010-10-05 |