MR

Mike Ravkin

Lam Research: 50 patents #30 of 2,128Top 2%
Overall (All Time): #54,595 of 4,157,543Top 2%
50
Patents All Time

Issued Patents All Time

Showing 1–25 of 50 patents

Patent #TitleCo-InventorsDate
10720343 Method and apparatus for processing wafer-shaped articles David Mui, Butch Berney, Alois Goller 2020-07-21
8997684 Prevention of particle adders when contacting a liquid meniscus over a substrate Enrico Magni, Suresh Gupta, Mark Gahagan, Eric H. Lenz 2015-04-07
8671959 Method and apparatus for cleaning a substrate using non-newtonian fluids John M. de Larios, Jeffrey Farber, Mikhail Korolik, Fred C. Redeker 2014-03-18
8623152 Reduction of entrance and exit marks left by a substrate-processing meniscus Robert O'Donnell, John M. de Larios 2014-01-07
8590550 Apparatus for cleaning contaminants from substrate Mikhail Korolik, Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Fritz Redeker 2013-11-26
8535451 Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids John M. de Larios, Jeffrey Farber, Mikhail Korolik, Fritz Redeker, Aleksander Owczarz 2013-09-17
8534303 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus Robert O'Donnell, Eric H. Lenz, Mark Wilcoxson, Alexander A. Yatskar 2013-09-17
8317932 Reduction of entrance and exit marks left by a substrate-processing meniscus Robert O'Donnell, John M. de Larios 2012-11-27
8313580 Method for processing a substrate using a single phase proximity head having a controlled meniscus Alex Kabansky, John M. de Larios 2012-11-20
8242067 Two-phase substrate cleaning material Mikhail Korolik, Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Fritz Redeker 2012-08-14
8105441 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus Robert O'Donnell, Eric H. Lenz, Mark Wilcoxson, Alexander A. Yatskar 2012-01-31
8043441 Method and apparatus for cleaning a substrate using non-Newtonian fluids John M. de Larios, Jeffrey Farber, Mikhail Korolik, Fred C. Redeker 2011-10-25
7997288 Single phase proximity head having a controlled meniscus for treating a substrate Alex Kabansky, John M. de Larios 2011-08-16
7946303 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus Robert O'Donnell, Eric H. Lenz, Mark Wilcoxson, Alexander A. Yatskar 2011-05-24
7947157 Apparatus and method for depositing and planarizing thin films of semiconductor wafers John M. Boyd, Yezdi Dordi, Fred C. Redeker, John M. de Larios 2011-05-24
7939139 Methods for atomic layer deposition (ALD) using a proximity meniscus Mikhail Korolik, Mark Wilcoxson 2011-05-10
7897213 Methods for contained chemical surface treatment Katrina Mikhaylichenko, Fritz Redeker, John M. de Larios, Erik M. Freer, Mikhail Korolik 2011-03-01
7799141 Method and system for using a two-phases substrate cleaning compound Mikhail Korolik, Erik M. Freer, John M. de Larios, Katrina Mikhaylichenko, Fritz Redeker 2010-09-21
7780825 Substrate gripper with integrated electrical contacts Aleksander Owczarz, Robert Knop, Carl Woods 2010-08-24
7703462 Reduction of entrance and exit marks left by a substrate-processing meniscus Robert O'Donnell, John M. de Larios 2010-04-27
7632376 Method and apparatus for atomic layer deposition (ALD) in a proximity system Mikhail Korolik, Mark Wilcoxson 2009-12-15
7614411 Controls of ambient environment during wafer drying using proximity head Mikhail Korolik, John M. de Larios, Jeffrey Farber 2009-11-10
7591613 Method and apparatus for transporting a substrate using non-newtonian fluid John M. de Larios, John Parks, Mikhail Korolik, Fred C. Redeker 2009-09-22
7568490 Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids John M. de Larios, Jeffrey Farber, Mikhail Korolik, Fritz Redeker, Aleksander Owczarz 2009-08-04
7464719 Multi-menisci processing apparatus James P. Garcia, Carl Woods, Fred C. Redeker, John M. de Larios 2008-12-16