Issued Patents All Time
Showing 1–25 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9287110 | Method and apparatus for wafer electroless plating | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2016-03-15 |
| 9117860 | Controlled ambient system for interface engineering | John M. Boyd, Yezdi Dordi, Tiruchirapalli Arunagiri, Benjamin W. Mooring, John Parks +7 more | 2015-08-25 |
| 8844461 | Fluid handling system for wafer electroless plating and associated methods | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2014-09-30 |
| 8535451 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | John M. de Larios, Mike Ravkin, Jeffrey Farber, Mikhail Korolik, Fritz Redeker | 2013-09-17 |
| 8485120 | Method and apparatus for wafer electroless plating | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2013-07-16 |
| 8314027 | Wafer electroless plating system and associated methods | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2012-11-20 |
| 8069813 | Wafer electroless plating system and associated methods | William Thie, John M. Boyd, Fritz Redeker, Yezdi Dordi, John Parks +5 more | 2011-12-06 |
| 7780825 | Substrate gripper with integrated electrical contacts | Robert Knop, Mike Ravkin, Carl Woods | 2010-08-24 |
| 7752996 | Apparatus for applying a plating solution for electroless deposition | Yezdi Dordi, William Thie, John M. Boyd, Fritz Redeker | 2010-07-13 |
| 7625452 | Apparatuses and methods for cleaning a substrate | John M. de Larios, Alan M. Schoepp, Fritz Redeker | 2009-12-01 |
| 7568490 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids | John M. de Larios, Mike Ravkin, Jeffrey Farber, Mikhail Korolik, Fritz Redeker | 2009-08-04 |
| 7542134 | System, method and apparatus for in-situ substrate inspection | Jaroslaw W. Winniczek, Luai Nasser, Alan M. Schoepp, Fred C. Redeker, Erik A. Edelberg | 2009-06-02 |
| 7441299 | Apparatuses and methods for cleaning a substrate | John M. de Larios, Alan M. Schoepp, Fritz Redeker | 2008-10-28 |
| 7397555 | System, method and apparatus for in-situ substrate inspection | Jaroslaw W. Winniczek, Luai Nasser, Alan M. Schoepp, Fred C. Redeker, Erik A. Edelberg | 2008-07-08 |
| 7309618 | Method and apparatus for real time metal film thickness measurement | Yehiel Gotkis, Rodney Kistler, David Hemker, Nicolas Bright | 2007-12-18 |
| 7205166 | Method and apparatus of arrayed, clustered or coupled eddy current sensor configuration for measuring conductive film properties | Yehiel Gotkis, Rodney Kistler, Charles Freund | 2007-04-17 |
| 7179154 | Method and apparatus for cleaning a wafer bevel edge and notch using a pin and an abrasive film cassette | John M. Boyd, Fritz Redeker, Jason A. Ryder | 2007-02-20 |
| 7138016 | Semiconductor processing apparatus | Timothy J. Reardon, Thomas H. Oberlitner, Craig P. Meuchel, Raymon F. Thompson | 2006-11-21 |
| 7128803 | Integration of sensor based metrology into semiconductor processing tools | Yehiel Gotkis, Dave Hemker, Rodney Kistler | 2006-10-31 |
| 7115023 | Process tape for cleaning or processing the edge of a semiconductor wafer | — | 2006-10-03 |
| 7094291 | Semiconductor processing apparatus | Timothy J. Reardon, Craig P. Meuchel, Thomas H. Oberlitner, Raymon F. Thompson | 2006-08-22 |
| 7084621 | Enhancement of eddy current based measurement capabilities | Yehiel Gotkis, Rodney Kistler, David Hemker, Nicolas Bright | 2006-08-01 |
| 7025854 | Method and apparatus for aligning and setting the axis of rotation of spindles of a multi-body system | John M. Boyd, Miguel Saldana | 2006-04-11 |
| 6951624 | Method and apparatus of arrayed sensors for metrological control | Yehiel Gotkis, Rodney Kistler, David Hemker, Nicolas Bright | 2005-10-04 |
| 6937915 | Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | Rodney Kistler, David Hemker, Yehiel Gotkis, Bruno Morel, Damon Vincent Williams | 2005-08-30 |