Issued Patents All Time
Showing 1–25 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8105131 | Method and apparatus for removing material from microfeature workpieces | Andrew Carswell | 2012-01-31 |
| 7875548 | Method for making semiconductor structures implementing sacrificial material | Yehiel Gotkis, David Wei | 2011-01-25 |
| 7628680 | Method and apparatus for removing material from microfeature workpieces | Andrew Carswell | 2009-12-08 |
| 7537511 | Embedded fiber acoustic sensor for CMP process endpoint | — | 2009-05-26 |
| 7425501 | Semiconductor structure implementing sacrificial material and methods for making and implementing the same | Yehiel Gotkis, David Wei | 2008-09-16 |
| 7381648 | Chemical mechanical polishing slurry useful for copper substrates | Vlasta Brusic Kaufman, Shumin Wang | 2008-06-03 |
| 7309618 | Method and apparatus for real time metal film thickness measurement | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2007-12-18 |
| 7294049 | Method and apparatus for removing material from microfeature workpieces | Andrew Carswell | 2007-11-13 |
| 7205166 | Method and apparatus of arrayed, clustered or coupled eddy current sensor configuration for measuring conductive film properties | Yehiel Gotkis, Aleksander Owczarz, Charles Freund | 2007-04-17 |
| 7128803 | Integration of sensor based metrology into semiconductor processing tools | Aleksander Owczarz, Yehiel Gotkis, Dave Hemker | 2006-10-31 |
| 7084621 | Enhancement of eddy current based measurement capabilities | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2006-08-01 |
| 7010468 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Yehiel Gotkis, Vladimir Katz, David Hemker, Nicolas Bright | 2006-03-07 |
| 6984892 | Semiconductor structure implementing low-K dielectric materials and supporting stubs | Yehiel Gotkis, David Wei | 2006-01-10 |
| 6951624 | Method and apparatus of arrayed sensors for metrological control | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-10-04 |
| 6937915 | Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | David Hemker, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel, Damon Vincent Williams | 2005-08-30 |
| 6929531 | System and method for metal residue detection and mapping within a multi-step sequence | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-08-16 |
| 6925348 | Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | David Hemker, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel, Damon Vincent Williams | 2005-08-02 |
| 6922053 | Complementary sensors metrological process and method and apparatus for implementing the same | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-07-26 |
| 6896596 | Polishing pad ironing system | Yehiel Gotkis, Aleksander Owczarz | 2005-05-24 |
| 6894491 | Method and apparatus for metrological process control implementing complementary sensors | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-05-17 |
| 6890245 | Byproduct control in linear chemical mechanical planarization system | — | 2005-05-10 |
| 6875322 | Electrochemical assisted CMP | — | 2005-04-05 |
| 6859765 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Yehiel Gotkis, Vladimir Katz, David Hemker, Nicolas Bright | 2005-02-22 |
| 6808590 | Method and apparatus of arrayed sensors for metrological control | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2004-10-26 |
| 6769961 | Chemical mechanical planarization (CMP) apparatus | Aleksander Owczarz | 2004-08-03 |