RK

Rodney Kistler

Lam Research: 24 patents #101 of 2,128Top 5%
CM Cabot Microelectronics: 10 patents #22 of 207Top 15%
Micron: 4 patents #2,657 of 6,345Top 45%
CA Cabot: 3 patents #184 of 601Top 35%
AT AT&T: 2 patents #7,280 of 18,772Top 40%
AT American Telephone And Telegraph: 1 patents #132 of 699Top 20%
📍 Easton, PA: #11 of 611 inventorsTop 2%
🗺 Pennsylvania: #914 of 74,527 inventorsTop 2%
Overall (All Time): #68,406 of 4,157,543Top 2%
44
Patents All Time

Issued Patents All Time

Showing 26–44 of 44 patents

Patent #TitleCo-InventorsDate
6752693 Afferent-based polishing media for chemical mechanical planarization 2004-06-22
6653224 Methods for fabricating interconnect structures having Low K dielectric properties Yehiel Gotkis, Leonid Romm, Te Hua Lin 2003-11-25
6620037 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman, Slumin Wang 2003-09-16
6593239 Chemical mechanical polishing method useful for copper substrates Vlasta Brusic Kaufman 2003-07-15
6579157 Polishing pad ironing system and method for implementing the same Yehiel Gotkis, Aleksander Owczarz 2003-06-17
6569350 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman, Shumin Wang 2003-05-27
6540587 Infrared end-point detection system Yehiel Gotkis 2003-04-01
6447371 Chemical mechanical polishing slurry useful for copper/tantalum substrates Vlasta Brusic Kaufman, Shumin Wang 2002-09-10
6432828 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman, Shumin Wang 2002-08-13
6362106 Chemical mechanical polishing method useful for copper substrates Vlasta Brusic Kaufman, Shumin Wang 2002-03-26
6309560 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman, Shumin Wang 2001-10-30
6217416 Chemical mechanical polishing slurry useful for copper/tantalum substrates Vlasta Brusic Kaufman, Shumin Wang 2001-04-17
6126853 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman, Shumin Wang 2000-10-03
6063306 Chemical mechanical polishing slurry useful for copper/tantalum substrate Vlasta Brusic Kaufman, Shumin Wang 2000-05-16
5954997 Chemical mechanical polishing slurry useful for copper substrates Vlasta Brusic Kaufman 1999-09-21
5858813 Chemical mechanical polishing slurry for metal layers and films Debra L. Scherber, Vlasta Brusic Kaufman, Brian L. Mueller, Christopher C. Streinz 1999-01-12
5195161 Optical waveguide comprising Bragg grating coupling means Renen Adar, Charles H. Henry, Rudolf F. Kazarinov 1993-03-16
5039190 Apparatus comprising an optical gain device, and method of producing the device Greg E. Blonder, Dale C. Jacobson, John M. Poate, Albert Polman 1991-08-13
4923271 Optical multiplexer/demultiplexer using focusing Bragg reflectors Charles H. Henry, Rudolf F. Kazarinov, Kenneth J. Orlowsky, Yosi Shani, Aasmund Sudbo 1990-05-08