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Microresistivity anisotropy logging tool employing a monopole current injection electrode |
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2013-11-12 |
| 7990153 |
Compensated directional resistivity measurements |
Tsili Wang |
2011-08-02 |
| 6793559 |
Composition and method for polishing rigid disks |
Mingming Fang, Shumin Wang |
2004-09-21 |
| 6767476 |
Polishing composition for metal CMP |
Shumin Wang, Steven Grumbine, Eric W. G. Hoglund |
2004-07-27 |
| 6592776 |
Polishing composition for metal CMP |
Shumin Wang, Steven Grumbine, Eric W. G. Hoglund |
2003-07-15 |
| 6582623 |
CMP composition containing silane modified abrasive particles |
Steven Grumbine, Shumin Wang |
2003-06-24 |
| 6383065 |
Catalytic reactive pad for metal CMP |
Steven Grumbine, Brian L. Mueller |
2002-05-07 |
| 6347978 |
Composition and method for polishing rigid disks |
Mingming Fang, Shumin Wang |
2002-02-19 |
| 6136711 |
Polishing composition including an inhibitor of tungsten etching |
Steven Grumbine, Eric W. G. Hoglund |
2000-10-24 |
| 6083419 |
Polishing composition including an inhibitor of tungsten etching |
Steven Grumbine, Eric W. G. Hoglund |
2000-07-04 |
| 6068787 |
Composition and slurry useful for metal CMP |
Steven Grumbine, Brian L. Mueller |
2000-05-30 |
| 6015506 |
Composition and method for polishing rigid disks |
Matthew Neville, Steven Grumbine, Brian L. Mueller |
2000-01-18 |
| 5993686 |
Fluoride additive containing chemical mechanical polishing slurry and method for use of same |
Brian L. Mueller, Michael A. Lucarelli, Max H. Walters |
1999-11-30 |
| 5980775 |
Composition and slurry useful for metal CMP |
Steven Grumbine, Brian L. Mueller |
1999-11-09 |
| 5958288 |
Composition and slurry useful for metal CMP |
Brian L. Mueller, Steven Grumbine |
1999-09-28 |
| 5858813 |
Chemical mechanical polishing slurry for metal layers and films |
Debra L. Scherber, Vlasta Brusic Kaufman, Rodney Kistler, Brian L. Mueller |
1999-01-12 |
