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USPTO Patent Rankings Data through Dec 31, 2025
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Mingming Fang — 20 Patents

CMCabot Microelectronics: 10 patents #22 of 207Top 15%
FTFuel Tech: 5 patents #13 of 60Top 25%
AIAmcol International: 4 patents #29 of 129Top 25%
Naperville, IL: #164 of 3,051 inventorsTop 6%
Illinois: #3,810 of 84,256 inventorsTop 5%
Overall (All Time): #214,803 of 4,157,543Top 6%
20 Patents All Time
Mingming Fang has been granted 20 US patents while listed as an inventor at Cabot Microelectronics. The first was granted in 2001 and the most recent in April 2024. Mingming Fang ranks #214,803 of 4,157,543 US inventors in our database (top 5.2%). Patent records list Mingming Fang in Naperville, IL, US.

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11944952 Removing contaminants from water with adsorbents Heng Wang 2024-04-02 $429,000
11332387 Removing arsenic from water with acid-activated clay Heng Wang 2022-05-17 $320,000
11332388 Removal of selenium from water with kaolinite Heng Wang 2022-05-17 $320,000
10857186 Traditional Chinese medicine composition for treating acute stage of cerebral infarction Hongquan Liu, Xiaolan Cheng, Jingbo LI, Shuting JIANG, Yudi LU +1 more 2020-12-08
8992868 Dry processes, apparatus compositions and systems for reducing mercury, sulfur oxides and HCl Christopher R. Smyrniotis, Kent W. Schulz, Emelito P. Rivera, Ian Saratovsky 2015-03-31 $725,000
8916120 Dry processes, apparatus, compositions and systems for reducing sulfur oxides and HCI Christopher R. Smyrniotis, Kent W. Schulz, Emelito P. Rivera, Ian Saratovsky 2014-12-23 $1,057,000
7267784 Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces Michael Ianiro, Don Eisenhour 2007-09-11 $7,339,000
7223156 Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces Michael Ianiro, Don Eisenhour 2007-05-29 $5,594,000
7112123 Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfaces Michael Ianiro, Don Eisenhour 2006-09-26 $7,413,000
7087529 Chemical-mechanical polishing (CMP) slurry and method of planarizing surfaces Michael Ianiro, Don Eisenhour 2006-08-08 $6,629,000
6976905 Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system Shumin Wang, Homer Chou 2005-12-20 $11,080,000
6805812 Phosphono compound-containing polishing composition and method of using same — 2004-10-19 $11,783,000
6793559 Composition and method for polishing rigid disks Christopher C. Streinz, Shumin Wang 2004-09-21 $11,218,000
6716755 Composition and method for planarizing surfaces Brian L. Mueller, James A. Dirksen 2004-04-06 $9,896,000
6527817 Composition and method for planarizing surfaces Brian L. Mueller, James A. Dirksen 2003-03-04 $3,631,000
6471884 Method for polishing a memory or rigid disk with an amino acid-containing composition Shumin Wang 2002-10-29 $5,850,000
6468137 Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system Shumin Wang 2002-10-22 $6,497,000
6461227 Method of polishing a memory or rigid disk with an ammonia-and/or halide-containing composition — 2002-10-08 $3,570,000
6347978 Composition and method for polishing rigid disks Christopher C. Streinz, Shumin Wang 2002-02-19 $5,404,000
6293848 Composition and method for planarizing surfaces Brian L. Mueller, James A. Dirksen 2001-09-25 $20,723,000

Nearby-Ranked Inventors

Anthony Mertes20
Ed Merjanian20
Arthur J. Higby20
Daniel Rosenberg20
Anthony J. Kuschel20
Mark E. Fauver20
Markus Wintermantel20
Dominik Schnieders20
Christopher P. Roche20