Issued Patents All Time
Showing 25 most recent of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11725116 | CMP composition including a novel abrasive | Alexander W. Hains, Kim Marie Long, Roman A. Ivanov, Kevin P. Dockery, Benjamin Petro +2 more | 2023-08-15 |
| 11034862 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2021-06-15 |
| 10988635 | Composition and method for copper barrier CMP | Steven Kraft, Fernando HUNG LOW, Roman A. Ivanov | 2021-04-27 |
| 10968366 | Composition and method for metal CMP | Steven Kraft, Fernando HUNG LOW, Daniel Clingerman, Roman A. Ivanov | 2021-04-06 |
| 10647887 | Tungsten buff polishing compositions with improved topography | Kevin P. Dockery, Pankaj Kumar Singh, Kim Marie Long | 2020-05-12 |
| 10508219 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2019-12-17 |
| 10358579 | CMP compositions and methods for polishing nickel phosphorous surfaces | Ke Zhang, Michael White, Tsung-Ho Lee, Hon Wu Lau | 2019-07-23 |
| 9803106 | Methods for fabricating a chemical-mechanical polishing composition | Jeffrey Dysard, Ernest Shen, Mary Cavanaugh, Daniel Clingerman | 2017-10-31 |
| 9617450 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2017-04-11 |
| 9566686 | Composition for tungsten CMP | Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener | 2017-02-14 |
| 9567491 | Tungsten chemical-mechanical polishing composition | Lin Fu, Jeffrey Dysard, Tina Li | 2017-02-14 |
| 9556363 | Copper barrier chemical-mechanical polishing composition | Lin Fu, Jeffrey Dysard, Wei Weng, Lei Liu, Alexei P. Leonov | 2017-01-31 |
| 9499721 | Colloidal silica chemical-mechanical polishing composition | Jeffrey Dysard, Ernest Shen, Mary Cavanaugh | 2016-11-22 |
| 9422457 | Colloidal silica chemical-mechanical polishing concentrate | Jeffrey Dysard, Ernest Shen, Mary Cavanaugh | 2016-08-23 |
| 9422456 | Colloidal silica chemical-mechanical polishing composition | Jeffrey Dysard, Ernest Shen, Mary Cavanaugh | 2016-08-23 |
| 9309442 | Composition for tungsten buffing | Lin Fu, Jeffrey Dysard | 2016-04-12 |
| 9303190 | Mixed abrasive tungsten CMP composition | William Ward, Glenn Whitener, Jeffrey Dysard | 2016-04-05 |
| 9303189 | Composition for tungsten CMP | Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener | 2016-04-05 |
| 9303188 | Composition for tungsten CMP | Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener | 2016-04-05 |
| 9238754 | Composition for tungsten CMP | Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener | 2016-01-19 |
| 9127187 | Mixed abrasive tungsten CMP composition | Jeffrey Dysard | 2015-09-08 |
| 9028572 | Polishing composition and method utilizing abrasive particles treated with an aminosilane | Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard | 2015-05-12 |
| 8961807 | CMP compositions with low solids content and methods related thereto | Lin Fu | 2015-02-24 |
| 8960177 | Wiresaw cutting method | Nevin Naguib Sant | 2015-02-24 |
| 8920667 | Chemical-mechanical polishing composition containing zirconia and metal oxidizer | Lin Fu, Matthias Stender | 2014-12-30 |