| 11725116 |
CMP composition including a novel abrasive |
Alexander W. Hains, Kim Marie Long, Roman A. Ivanov, Kevin P. Dockery, Benjamin Petro +2 more |
2023-08-15 |
|
| 11034862 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard |
2021-06-15 |
$41,135,000 |
| 10988635 |
Composition and method for copper barrier CMP |
Steven Kraft, Fernando HUNG LOW, Roman A. Ivanov |
2021-04-27 |
$53,046,000 |
| 10968366 |
Composition and method for metal CMP |
Steven Kraft, Fernando HUNG LOW, Daniel Clingerman, Roman A. Ivanov |
2021-04-06 |
$29,497,000 |
| 10647887 |
Tungsten buff polishing compositions with improved topography |
Kevin P. Dockery, Pankaj Kumar Singh, Kim Marie Long |
2020-05-12 |
$14,110,000 |
| 10508219 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard |
2019-12-17 |
$17,763,000 |
| 10358579 |
CMP compositions and methods for polishing nickel phosphorous surfaces |
Ke Zhang, Michael White, Tsung-Ho Lee, Hon Wu Lau |
2019-07-23 |
$17,148,000 |
| 9803106 |
Methods for fabricating a chemical-mechanical polishing composition |
Jeffrey Dysard, Ernest Shen, Mary Cavanaugh, Daniel Clingerman |
2017-10-31 |
$5,878,000 |
| 9617450 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard |
2017-04-11 |
$8,165,000 |
| 9566686 |
Composition for tungsten CMP |
Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener |
2017-02-14 |
$5,850,000 |
| 9567491 |
Tungsten chemical-mechanical polishing composition |
Lin Fu, Jeffrey Dysard, Tina Li |
2017-02-14 |
$5,850,000 |
| 9556363 |
Copper barrier chemical-mechanical polishing composition |
Lin Fu, Jeffrey Dysard, Wei Weng, Lei Liu, Alexei P. Leonov |
2017-01-31 |
$19,023,000 |
| 9499721 |
Colloidal silica chemical-mechanical polishing composition |
Jeffrey Dysard, Ernest Shen, Mary Cavanaugh |
2016-11-22 |
$16,146,000 |
| 9422457 |
Colloidal silica chemical-mechanical polishing concentrate |
Jeffrey Dysard, Ernest Shen, Mary Cavanaugh |
2016-08-23 |
$5,125,000 |
| 9422456 |
Colloidal silica chemical-mechanical polishing composition |
Jeffrey Dysard, Ernest Shen, Mary Cavanaugh |
2016-08-23 |
$5,125,000 |
| 9309442 |
Composition for tungsten buffing |
Lin Fu, Jeffrey Dysard |
2016-04-12 |
$17,281,000 |
| 9303190 |
Mixed abrasive tungsten CMP composition |
William Ward, Glenn Whitener, Jeffrey Dysard |
2016-04-05 |
$4,332,000 |
| 9303189 |
Composition for tungsten CMP |
Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener |
2016-04-05 |
$4,332,000 |
| 9303188 |
Composition for tungsten CMP |
Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener |
2016-04-05 |
$4,332,000 |
| 9238754 |
Composition for tungsten CMP |
Jeffrey Dysard, Lin Fu, William Ward, Glenn Whitener |
2016-01-19 |
$3,753,000 |
| 9127187 |
Mixed abrasive tungsten CMP composition |
Jeffrey Dysard |
2015-09-08 |
$5,738,000 |
| 9028572 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Shoutian Li, William Ward, Pankaj Kumar Singh, Jeffrey Dysard |
2015-05-12 |
$14,060,000 |
| 8961807 |
CMP compositions with low solids content and methods related thereto |
Lin Fu |
2015-02-24 |
$6,891,000 |
| 8960177 |
Wiresaw cutting method |
Nevin Naguib Sant |
2015-02-24 |
$6,891,000 |
| 8920667 |
Chemical-mechanical polishing composition containing zirconia and metal oxidizer |
Lin Fu, Matthias Stender |
2014-12-30 |
$13,544,000 |