JD

Jeffrey Dysard

CM Cabot Microelectronics: 32 patents #3 of 207Top 2%
EX ExxonMobil: 3 patents #3,051 of 10,161Top 35%
CM Cmc Materials: 1 patents #33 of 67Top 50%
Overall (All Time): #94,021 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 25 most recent of 36 patents

Patent #TitleCo-InventorsDate
11034862 Polishing composition and method utilizing abrasive particles treated with an aminosilane Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh 2021-06-15
10508219 Polishing composition and method utilizing abrasive particles treated with an aminosilane Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh 2019-12-17
9803106 Methods for fabricating a chemical-mechanical polishing composition Steven Grumbine, Ernest Shen, Mary Cavanaugh, Daniel Clingerman 2017-10-31
9617450 Polishing composition and method utilizing abrasive particles treated with an aminosilane Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh 2017-04-11
9566686 Composition for tungsten CMP Steven Grumbine, Lin Fu, William Ward, Glenn Whitener 2017-02-14
9567491 Tungsten chemical-mechanical polishing composition Lin Fu, Steven Grumbine, Tina Li 2017-02-14
9556363 Copper barrier chemical-mechanical polishing composition Lin Fu, Steven Grumbine, Wei Weng, Lei Liu, Alexei P. Leonov 2017-01-31
9499721 Colloidal silica chemical-mechanical polishing composition Steven Grumbine, Ernest Shen, Mary Cavanaugh 2016-11-22
9434859 Chemical-mechanical planarization of polymer films Sudeep Pallikkara Kuttiatoor, Renhe Jia 2016-09-06
9422456 Colloidal silica chemical-mechanical polishing composition Steven Grumbine, Ernest Shen, Mary Cavanaugh 2016-08-23
9422457 Colloidal silica chemical-mechanical polishing concentrate Steven Grumbine, Ernest Shen, Mary Cavanaugh 2016-08-23
9340706 Mixed abrasive polishing compositions Brian Reiss, Jakub W. Nalaskowski, Viet Lam, Renhe Jia 2016-05-17
9309442 Composition for tungsten buffing Lin Fu, Steven Grumbine 2016-04-12
9303190 Mixed abrasive tungsten CMP composition William Ward, Glenn Whitener, Steven Grumbine 2016-04-05
9303189 Composition for tungsten CMP Steven Grumbine, Lin Fu, William Ward, Glenn Whitener 2016-04-05
9303188 Composition for tungsten CMP Steven Grumbine, Lin Fu, William Ward, Glenn Whitener 2016-04-05
9281210 Wet-process ceria compositions for polishing substrates, and methods related thereto Brian Reiss, Sairam Shekhar 2016-03-08
9238754 Composition for tungsten CMP Steven Grumbine, Lin Fu, William Ward, Glenn Whitener 2016-01-19
9165489 CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity Tina Li, Kevin P. Dockery, Renhe Jia 2015-10-20
9127187 Mixed abrasive tungsten CMP composition Steven Grumbine 2015-09-08
9028572 Polishing composition and method utilizing abrasive particles treated with an aminosilane Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh 2015-05-12
8906252 CMP compositions selective for oxide and nitride with high removal rate and low defectivity Kevin P. Dockery, Renhe Jia 2014-12-09
8759216 Compositions and methods for polishing silicon nitride materials Sriram Anjur, Timothy Johns, Zhan Chen 2014-06-24
8741009 Polishing composition containing polyether amine Paul M. Feeney, Sriram Anjur, Timothy Johns, Yun-Biao Xin, Li Xia Wang 2014-06-03
8623767 Method for polishing aluminum/copper and titanium in damascene structures Vlasta Brusic, Christopher Thompson 2014-01-07