| 11034862 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh |
2021-06-15 |
$41,135,000 |
| 10508219 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh |
2019-12-17 |
$17,763,000 |
| 9803106 |
Methods for fabricating a chemical-mechanical polishing composition |
Steven Grumbine, Ernest Shen, Mary Cavanaugh, Daniel Clingerman |
2017-10-31 |
$5,878,000 |
| 9617450 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh |
2017-04-11 |
$8,165,000 |
| 9566686 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2017-02-14 |
$5,850,000 |
| 9567491 |
Tungsten chemical-mechanical polishing composition |
Lin Fu, Steven Grumbine, Tina Li |
2017-02-14 |
$5,850,000 |
| 9556363 |
Copper barrier chemical-mechanical polishing composition |
Lin Fu, Steven Grumbine, Wei Weng, Lei Liu, Alexei P. Leonov |
2017-01-31 |
$19,023,000 |
| 9499721 |
Colloidal silica chemical-mechanical polishing composition |
Steven Grumbine, Ernest Shen, Mary Cavanaugh |
2016-11-22 |
$16,146,000 |
| 9434859 |
Chemical-mechanical planarization of polymer films |
Sudeep Pallikkara Kuttiatoor, Renhe Jia |
2016-09-06 |
$20,294,000 |
| 9422456 |
Colloidal silica chemical-mechanical polishing composition |
Steven Grumbine, Ernest Shen, Mary Cavanaugh |
2016-08-23 |
$5,125,000 |
| 9422457 |
Colloidal silica chemical-mechanical polishing concentrate |
Steven Grumbine, Ernest Shen, Mary Cavanaugh |
2016-08-23 |
$5,125,000 |
| 9340706 |
Mixed abrasive polishing compositions |
Brian Reiss, Jakub W. Nalaskowski, Viet Lam, Renhe Jia |
2016-05-17 |
$8,405,000 |
| 9309442 |
Composition for tungsten buffing |
Lin Fu, Steven Grumbine |
2016-04-12 |
$17,281,000 |
| 9303190 |
Mixed abrasive tungsten CMP composition |
William Ward, Glenn Whitener, Steven Grumbine |
2016-04-05 |
$4,332,000 |
| 9303189 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2016-04-05 |
$4,332,000 |
| 9303188 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2016-04-05 |
$4,332,000 |
| 9281210 |
Wet-process ceria compositions for polishing substrates, and methods related thereto |
Brian Reiss, Sairam Shekhar |
2016-03-08 |
$6,030,000 |
| 9238754 |
Composition for tungsten CMP |
Steven Grumbine, Lin Fu, William Ward, Glenn Whitener |
2016-01-19 |
$3,753,000 |
| 9165489 |
CMP compositions selective for oxide over polysilicon and nitride with high removal rate and low defectivity |
Tina Li, Kevin P. Dockery, Renhe Jia |
2015-10-20 |
$12,620,000 |
| 9127187 |
Mixed abrasive tungsten CMP composition |
Steven Grumbine |
2015-09-08 |
$5,738,000 |
| 9028572 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
Steven Grumbine, Shoutian Li, William Ward, Pankaj Kumar Singh |
2015-05-12 |
$14,060,000 |
| 8906252 |
CMP compositions selective for oxide and nitride with high removal rate and low defectivity |
Kevin P. Dockery, Renhe Jia |
2014-12-09 |
|
| 8759216 |
Compositions and methods for polishing silicon nitride materials |
Sriram Anjur, Timothy Johns, Zhan Chen |
2014-06-24 |
$13,781,000 |
| 8741009 |
Polishing composition containing polyether amine |
Paul M. Feeney, Sriram Anjur, Timothy Johns, Yun-Biao Xin, Li Xia Wang |
2014-06-03 |
$15,760,000 |
| 8623767 |
Method for polishing aluminum/copper and titanium in damascene structures |
Vlasta Brusic, Christopher Thompson |
2014-01-07 |
$8,457,000 |
