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Compositions for polishing aluminum/copper and titanium in damascene structures |
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2016-05-17 |
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Polishing composition containing polyether amine |
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2014-06-03 |
| 7998335 |
Controlled electrochemical polishing method |
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2011-08-16 |
| 7897061 |
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Jeffrey Dysard, Sriram Anjur |
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Polishing composition containing polyether amine |
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2009-09-08 |
| 6841479 |
Method of reducing in-trench smearing during polishing |
Isaac K. Cherian, Kevin Moeggenborg |
2005-01-11 |
| 6726534 |
Preequilibrium polishing method and system |
Gregory Bogush, Jeffrey P. Chamberlain, Brian L. Mueller, David Schroeder, Alicia Walters |
2004-04-27 |
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Chemical-mechanical planarization of metallurgy |
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| 6503827 |
Method of reducing planarization defects |
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| 6495917 |
Method and structure of column interconnect |
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Metallurgy for semiconductor devices |
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2002-07-30 |
| 6355565 |
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2002-03-12 |
| 6350393 |
Use of CsOH in a dielectric CMP slurry |
Alicia F. Francis, Brian L. Mueller, James A. Dirksen |
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Slurry for mechanical polishing (CMP) of metals and use thereof |
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Chemical mechanical polishing slurry and method for polishing metal/oxide layers |
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| 6007411 |
Wafer carrier for chemical mechanical polishing |
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1999-12-28 |