PF

Paul M. Feeney

CM Cabot Microelectronics: 9 patents #26 of 207Top 15%
IBM: 8 patents #13,150 of 70,183Top 20%
Overall (All Time): #276,423 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9343330 Compositions for polishing aluminum/copper and titanium in damascene structures Vlasta Brusic, Renjie Zhou, Christopher Thompson 2016-05-17
8741009 Polishing composition containing polyether amine Jeffrey Dysard, Sriram Anjur, Timothy Johns, Yun-Biao Xin, Li Xia Wang 2014-06-03
7998335 Controlled electrochemical polishing method Vlasta Brusic 2011-08-16
7897061 Compositions and methods for CMP of phase change alloys Jeffrey Dysard, Sriram Anjur 2011-03-01
7837888 Composition and method for damascene CMP Sriram Anjur, Jeffrey Dysard 2010-11-23
7585340 Polishing composition containing polyether amine Jeffrey Dysard, Sriram Anjur, Timothy Johns, Yun-Biao Xin, Li Xia Wang 2009-09-08
6841479 Method of reducing in-trench smearing during polishing Isaac K. Cherian, Kevin Moeggenborg 2005-01-11
6726534 Preequilibrium polishing method and system Gregory Bogush, Jeffrey P. Chamberlain, Brian L. Mueller, David Schroeder, Alicia Walters 2004-04-27
6632377 Chemical-mechanical planarization of metallurgy Vlasta Brusic, Daniel C. Edelstein, William L. Guthrie, Mark A. Jaso, Frank B. Kaufman +4 more 2003-10-14
6503827 Method of reducing planarization defects Susan G. Bombardier, Robert M. Geffken, David V. Horak, Matthew J. Rutten 2003-01-07
6495917 Method and structure of column interconnect John J. Ellis-Monaghan, Robert M. Geffken, Howard S. Landis, Rosemary A. Previti-Kelly, Bette L. Bergman Reuter +3 more 2002-12-17
6426558 Metallurgy for semiconductor devices Jonathan D. Chapple-Sokol, Robert M. Geffken, David V. Horak, Mark P. Murray, Anthony K. Stamper 2002-07-30
6355565 Chemical-mechanical-polishing slurry and method for polishing metal/oxide layers Timothy C. Krywanczyk, Lawrence D. David, Matthew T. Tiersch, Eric J. White 2002-03-12
6350393 Use of CsOH in a dielectric CMP slurry Alicia F. Francis, Brian L. Mueller, James A. Dirksen 2002-02-26
6348076 Slurry for mechanical polishing (CMP) of metals and use thereof Donald F. Canaperi, William J. Cote, Mahadevaiyer Krishnan, Joyce C. Liu, Michael F. Lofaro +2 more 2002-02-19
6294105 Chemical mechanical polishing slurry and method for polishing metal/oxide layers Timothy C. Krywanczyk, Lawrence D. David, Matthew T. Tiersch, Eric J. White 2001-09-25
6007411 Wafer carrier for chemical mechanical polishing 1999-12-28