Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10016762 | Vertical bowl mill for producing coarse ground particles | Michael M. Chen, Jianrong Chen | 2018-07-10 |
| 9548211 | Method to selectively polish silicon carbide films | William Ward | 2017-01-17 |
| 8759216 | Compositions and methods for polishing silicon nitride materials | Jeffrey Dysard, Sriram Anjur, Zhan Chen | 2014-06-24 |
| 8741009 | Polishing composition containing polyether amine | Jeffrey Dysard, Paul M. Feeney, Sriram Anjur, Yun-Biao Xin, Li Xia Wang | 2014-06-03 |
| 8697576 | Composition and method for polishing polysilicon | Brian Reiss, Michael White, Lamon Jones, John Clark | 2014-04-15 |
| 8486169 | Method of polishing a silicon-containing dielectric | Phillip W. Carter | 2013-07-16 |
| 8138091 | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios | Jeffrey Dysard | 2012-03-20 |
| 7846842 | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios | Phillip W. Carter | 2010-12-07 |
| 7677956 | Compositions and methods for dielectric CMP | Phillip W. Carter, Gregory Bogush, Farhana Khan, Robert Vacassy | 2010-03-16 |
| 7585340 | Polishing composition containing polyether amine | Jeffrey Dysard, Paul M. Feeney, Sriram Anjur, Yun-Biao Xin, Li Xia Wang | 2009-09-08 |
| 7531105 | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios | Jeffrey Dysard | 2009-05-12 |
| 7504044 | Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios | Phillip W. Carter | 2009-03-17 |
| 7442645 | Method of polishing a silicon-containing dielectric | Phillip W. Carter | 2008-10-28 |
| 7071105 | Method of polishing a silicon-containing dielectric | Phillip W. Carter | 2006-07-04 |