Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9951054 | CMP porous pad with particles in a polymeric matrix | Shoutian Li, Jaishankar Kasthuri | 2018-04-24 |
| 9463551 | Polishing pad with porous interface and solid core, and related apparatus and methods | George Fotou | 2016-10-11 |
| 9074118 | CMP method for metal-containing substrates | Renjie Zhou | 2015-07-07 |
| 7677956 | Compositions and methods for dielectric CMP | Phillip W. Carter, Gregory Bogush, Farhana Khan, Timothy Johns | 2010-03-16 |
| 7582127 | Polishing composition for a tungsten-containing substrate | Dinesh N. Khanna, Alexander William Simpson | 2009-09-01 |
| 7294576 | Tunable selectivity slurries in CMP applications | Zhan Chen, Benjamin Bayer, Dinesh N. Khanna | 2007-11-13 |
| 7247567 | Method of polishing a tungsten-containing substrate | Dinesh N. Khanna, Alexander William Simpson | 2007-07-24 |
| 6682575 | Methanol-containing silica-based CMP compositions | — | 2004-01-27 |
| 6458335 | Production of powders | Jacques Lemaitre, Nathalie Jongen, Paul Bowen | 2002-10-01 |