Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7582127 | Polishing composition for a tungsten-containing substrate | Robert Vacassy, Alexander William Simpson | 2009-09-01 |
| 7294576 | Tunable selectivity slurries in CMP applications | Zhan Chen, Robert Vacassy, Benjamin Bayer | 2007-11-13 |
| 7247567 | Method of polishing a tungsten-containing substrate | Robert Vacassy, Alexander William Simpson | 2007-07-24 |
| 6368421 | Composition for stripping photoresist and organic materials from substrate surfaces | Joseph E. Oberlander, Mark Steven Slezak, Dana L. Durham, Lawrence F. Spinicelli | 2002-04-09 |
| 6346361 | Method for synthesizing polymeric AZO dyes | Jianhui Shan, Shuji Ding, Eleazar Gonzalez | 2002-02-12 |
| 6187506 | Antireflective coating for photoresist compositions | Shuji Ding, Mark A. Spak, Dana L. Durham, Jianhui Shan, Eleazer Gonzalez | 2001-02-13 |
| 6106995 | Antireflective coating material for photoresists | Sunit S. Dixit, M. Dalil Rahman, Joseph E. Oberlander, Dana L. Durham | 2000-08-22 |
| 5994430 | Antireflective coating compositions for photoresist compositions and use thereof | Shuji Ding, Ping-Hung Lu, Jianhui Shan, Dana L. Durham, Ralph R. Dammel +1 more | 1999-11-30 |
| 5981145 | Light absorbing polymers | Shuji Ding, Ping-Hung Lu, Jianhui Shan, Ralph R. Dammel, Dana L. Durham +2 more | 1999-11-09 |
| 5976761 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Daniel P. Aubin, Sunit S. Dixit | 1999-11-02 |
| 5876897 | Positive photoresists containing novel photoactive compounds | Dana L. Durham, Ping-Hung Lu, Joseph E. Oberlander | 1999-03-02 |
| 5866295 | Photosensitive quinolone compounds and a process of preparation | Joseph E. Oberlander, Dana L. Durham | 1999-02-02 |
| 5858627 | Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers | M. Dalil Rahman, Daniel P. Aubin, Douglas McKenzie | 1999-01-12 |
| 5853947 | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate | Stanley F. Wanat, M. Dalil Rahman, Daniel P. Aubin, Sunit S. Dixit | 1998-12-29 |
| 5837417 | Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition | M. Dalil Rahman, Daniel P. Aubin, Douglas McKenzie | 1998-11-17 |
| 5763135 | Light sensitive composition containing an arylhydrazo dye | Shuji Ding, Ping-Hung Lu, Anthony J. Corso | 1998-06-09 |
| 5739265 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Daniel P. Aubin, Sunit S. Dixit | 1998-04-14 |
| 5733714 | Antireflective coating for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Anthony J. Corso, Shuji Ding, Dana L. Durham +2 more | 1998-03-31 |
| 5693749 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Daniel P. Aubin, Sunit S. Dixit | 1997-12-02 |
| 5652297 | Aqueous antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Dana L. Durham, Ping-Hung Lu, Ming Kang +1 more | 1997-07-29 |
| 5521052 | Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom | M. Dalil Rahman, Daniel P. Aubin, Douglas McKenzie | 1996-05-28 |
| 5395871 | Process of making a stable solution of poly(hydroxystyrene) functionalized with t-butyloxycarbonyl groups | — | 1995-03-07 |
| 5371169 | Novolak resin mixtures | Ping-Hung Lu, Anthony Canize, M. Dalil Rahman | 1994-12-06 |
| 5348842 | Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride | Douglas McKenzie, Chester J. Sobodacha, Ralph R. Dammel | 1994-09-20 |
| 5300396 | Process of making naphthoquinone diazide esters using lactone solvents | Robert E. Potvin | 1994-04-05 |