Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6165675 | Isolation of novolak resin by low temperature sub surface forced steam distillation | M. Dalil Rahman | 2000-12-26 |
| 5976761 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Dinesh N. Khanna, Sunit S. Dixit | 1999-11-02 |
| 5962183 | Metal ion reduction in photoresist compositions by chelating ion exchange resin | M. Dalil Rahman | 1999-10-05 |
| 5858627 | Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers | M. Dalil Rahman, Dinesh N. Khanna, Douglas McKenzie | 1999-01-12 |
| 5853947 | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate | Stanley F. Wanat, M. Dalil Rahman, Dinesh N. Khanna, Sunit S. Dixit | 1998-12-29 |
| 5837417 | Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition | M. Dalil Rahman, Dinesh N. Khanna, Douglas McKenzie | 1998-11-17 |
| 5750031 | Process for producing surfactant having a low metal ion level and developer produced therefrom | M. Dalil Rahman | 1998-05-12 |
| 5750632 | Isolation of novolak resin by low temperature sub surface forced steam distillation | M. Dalil Rahman | 1998-05-12 |
| 5739265 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Dinesh N. Khanna, Sunit S. Dixit | 1998-04-14 |
| 5693749 | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom | M. Dalil Rahman, Dinesh N. Khanna, Sunit S. Dixit | 1997-12-02 |
| 5688893 | Method of using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Dana L. Durham, Ralph R. Dammel | 1997-11-18 |
| 5665517 | Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom | M. Dalil Rahman, Elaine G. Kokinda, Dana L. Durham | 1997-09-09 |
| 5656413 | Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom | M. Dalil Rahman | 1997-08-12 |
| 5614349 | Using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Dana L. Durham, Ralph R. Dammel | 1997-03-25 |
| 5521052 | Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom | M. Dalil Rahman, Dinesh N. Khanna, Douglas McKenzie | 1996-05-28 |
| 5476750 | Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists | M. Dalil Rahman, Ping-Hung Lu, Ralph R. Dammel, Dana L. Durham | 1995-12-19 |