Issued Patents All Time
Showing 1–25 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9505721 | Aromatic imide compound and method for producing same | Eri Hirahara, Georg Pawlowski | 2016-11-29 |
| 8663906 | Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same | Wen-Bing Kang, Yasuo Shimizu, Tomonori Ishikawa | 2014-03-04 |
| 8524441 | Silicon-based antireflective coating compositions | Ruzhi Zhang, WooKyu Kim, David Abdallah, PingHung Lu, Mark Neisser +1 more | 2013-09-03 |
| 8329387 | Antireflective coating compositions | Huirong Yao, Guanyang Lin, Jian Yin, Hengpeng Wu, Mark Neisser | 2012-12-11 |
| 8084186 | Hardmask process for forming a reverse tone image using polysilazane | David Abdallah, Yusuke Takano, Jin Li, Kazunori Kurosawa | 2011-12-27 |
| 7923200 | Composition for coating over a photoresist pattern comprising a lactam | Muthiah Thiyagarajan, Yi Cao, SungEun Hong, Wenbing Kang, Clement Anyadiegwu | 2011-04-12 |
| 7833693 | Photoactive compounds | M. Dalil Rahman, Francis Houlihan, Munirathna Padmanaban, Sangho Lee, David L. Rentkiewicz +1 more | 2010-11-16 |
| 7816071 | Process of imaging a photoresist with multiple antireflective coatings | David Abdallah, Mark Neisser, Georg Pawlowski, John Biafore, Andrew R. Romano | 2010-10-19 |
| 7745077 | Composition for coating over a photoresist pattern | Muthiah Thiyagarajan, Yi Cao, Sung-Eun Hong | 2010-06-29 |
| 7595141 | Composition for coating over a photoresist pattern | Takanori Kudo, Munirathna Padmanaban | 2009-09-29 |
| 7547501 | Photoactive compounds | M. Dalil Rahman, David L. Rentkiewicz, Karl van Werden | 2009-06-16 |
| 7537879 | Photoresist composition for deep UV and process thereof | Francis Houlihan, Andrew R. Romano, Munirathna Padmanaban, M. Dalil Rahman | 2009-05-26 |
| 7521170 | Photoactive compounds | M. Dalil Rahman, Francis Houlihan, Munirathna Padmanaban, Sangho Lee, David L. Rentkiewicz +1 more | 2009-04-21 |
| 7473512 | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof | Francis Houlihan, Andrew R. Romano, Raj Sakamuri | 2009-01-06 |
| 7416834 | Antireflective coating compositions | David Abdallah | 2008-08-26 |
| 7351521 | Photoresist composition for deep ultraviolet lithography | Raj Sakamuri, Francis Houlihan | 2008-04-01 |
| 7211366 | Photoresist composition for deep ultraviolet lithography | Raj Sakamuri, Francis Houlihan | 2007-05-01 |
| 7169531 | Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives | Christoph Hohle, Michael Francis Houlihan | 2007-01-30 |
| 7033728 | Photoresist composition | — | 2006-04-25 |
| 6991888 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | Munirathna Padmanaban, Takanori Kudo, Sangho Lee, M. Dalil Rahman | 2006-01-31 |
| 6852465 | Photoresist composition for imaging thick films | Stephen Meyer, Mark A. Spak | 2005-02-08 |
| 6844131 | Positive-working photoimageable bottom antireflective coating | Joseph E. Oberlander, Shuji Ding-Lee, Mark Neisser, Medhat A. Toukhy | 2005-01-18 |
| 6800415 | Negative-acting aqueous photoresist composition | Ping-Hung Lu, Mark Neisser, Hengpeng Wu | 2004-10-05 |
| 6800416 | Negative deep ultraviolet photoresist | Takanori Kudo, Munirathna Padmanaban, Medhat A. Touky | 2004-10-05 |
| 6737215 | Photoresist composition for deep ultraviolet lithography | Raj Sakamuri | 2004-05-18 |