TK

Takanori Kudo

HI Hitachi: 8 patents #5,191 of 28,497Top 20%
HL Hoechst Japan Limited: 7 patents #6 of 137Top 5%
CL Clariant Finance (Bvi) Limited: 6 patents #41 of 535Top 8%
AU Az Electronic Materials Usa: 6 patents #18 of 135Top 15%
AS Az Electronic Materials (Luxembourg) S.A.R.L.: 2 patents #58 of 145Top 40%
BA Babcock-Hitachi: 2 patents #128 of 415Top 35%
Merck: 2 patents #3,919 of 9,382Top 45%
📍 Bedminster, NJ: #6 of 199 inventorsTop 4%
🗺 New Jersey: #2,109 of 69,400 inventorsTop 4%
Overall (All Time): #115,760 of 4,157,543Top 3%
31
Patents All Time

Issued Patents All Time

Showing 1–25 of 31 patents

Patent #TitleCo-InventorsDate
12360453 PAG-free positive chemically amplified resist composition and methods of using the same Hung-Yang Chen 2025-07-15
12276909 Novolak/DNQ based, chemically amplified photoresist Medhat A. Toukhy, Weihong Liu, Hung-Yang Chen, Jian Yin 2025-04-15
9274426 Antireflective coating compositions and processes thereof M. Dalil Rahman, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban +1 more 2016-03-01
9152051 Antireflective coating composition and process thereof M. Dalil Rahman, Clement Anyadiegwu, Douglas McKenzie, Elizabeth WOLFER, Salem K. Mullen 2015-10-06
8623589 Bottom antireflective coating compositions and processes thereof Alberto D. Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban 2014-01-07
8252503 Photoresist compositions Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, David L. Rentkiewicz 2012-08-28
7601480 Photoactive compounds M. Dalil Rahman 2009-10-13
7595141 Composition for coating over a photoresist pattern Munirathna Padmanaban, Ralph R. Dammel 2009-09-29
7122291 Photoresist compositions Munirathna Padmanaban, Guanyang Lin, Chi-Sun Hong, M. Dalil Rahman 2006-10-17
6991888 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds Munirathna Padmanaban, Sangho Lee, Ralph R. Dammel, M. Dalil Rahman 2006-01-31
6800416 Negative deep ultraviolet photoresist Munirathna Padmanaban, Ralph R. Dammel, Medhat A. Touky 2004-10-05
6737492 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating Wen-Bing Kang, Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski 2004-05-18
6723488 Photoresist composition for deep UV radiation containing an additive Ralph R. Dammel, Munirathna Padmanaban 2004-04-20
6610465 Process for producing film forming resins for photoresist compositions M. Dalil Rahman, Douglas McKenzie, Munirathna Padmanaban 2003-08-26
6468718 Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating Wen-Bing Kang, Munirathna Padmanaban, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski 2002-10-22
6372403 Photosensitive resin composition Minoru Kurisaki, Takamasa Harada, Takashi Takeda, Junichi Fukuzawa 2002-04-16
5882843 Photosensitive resin composition for color filter production Yuko Nozaki, Kazuya Nagao, Yuki Nanjo 1999-03-16
5843319 Positive-working radiation-sensitive mixture Klaus-Juergen Przybilla, Seiya Masuda, Yoshiaki Kinoshita, Natsumi Suehiro, Munirathna Padmanaban +4 more 1998-12-01
5782032 Coal gasification furnace with a slag tap hole of specific shape Sinji Tanaka, Shuntaro Koyama, Atsushi Morihara, Sadao Takahashi, Masato Iwahara 1998-07-21
5725615 Entrained bed coal gasification reactor and method of gasifying coal Atsushi Morihara, Sinji Tanaka, Shuntaro Koyama, Eiji Kida 1998-03-10
5691100 Pattern forming material including photoacid and photobase generators for large exposure latitude Seiya Masuda, Yoshiaki Kinoshita, Klaus-Juergen Przybilla, Natsumi Endo, Natsumi Suehiro +1 more 1997-11-25
5663035 Radiation-sensitive mixture comprising a basic iodonium compound Seiya Masuda, Munirathna Padmanaban, Yoshiaki Kinoshita, Natsumi Suehiro, Yuko Nozaki +2 more 1997-09-02
5641594 Colored, photosensitive resin composition Yuko Nozaki, Kazuya Nagao, Yuki Nanjo, Hiroshi Okazaki, Yoshiaki Kinoshita +3 more 1997-06-24
5595855 Radiation sensitive composition Munirathna Padmanaban, Yoshiaki Kinoshita, Natsumi Suehiro, Seiya Masuda, Yuko Nozaki +2 more 1997-01-21
5525453 Positive-working radiation-sensitive mixture Klaus-Juergen Przybilla, Seiya Masuda, Yoshiaki Kinoshita, Natumi Suehiro, Munirathna Padmanaban +4 more 1996-06-11