NS

Natsumi Suehiro

HL Hoechst Japan Limited: 6 patents #8 of 137Top 6%
📍 Kawagoe, JP: #303 of 1,278 inventorsTop 25%
Overall (All Time): #887,475 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
5843319 Positive-working radiation-sensitive mixture Klaus-Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Munirathna Padmanaban +4 more 1998-12-01
5738972 Radiation sensitive composition Munirathna Padmanaban, Yoshiaki Kinoshita, Satoru Funato, Seiya Masuda, Hiroshi Okazaki +1 more 1998-04-14
5691100 Pattern forming material including photoacid and photobase generators for large exposure latitude Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Klaus-Juergen Przybilla, Natsumi Endo +1 more 1997-11-25
5663035 Radiation-sensitive mixture comprising a basic iodonium compound Seiya Masuda, Munirathna Padmanaban, Takanori Kudo, Yoshiaki Kinoshita, Yuko Nozaki +2 more 1997-09-02
5641594 Colored, photosensitive resin composition Takanori Kudo, Yuko Nozaki, Kazuya Nagao, Yuki Nanjo, Hiroshi Okazaki +3 more 1997-06-24
5595855 Radiation sensitive composition Munirathna Padmanaban, Yoshiaki Kinoshita, Takanori Kudo, Seiya Masuda, Yuko Nozaki +2 more 1997-01-21