Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7195863 | Development defect preventing process and material | Yusuke Takano, Kazuyo Ijima, Yoshio Murakami, Hatsuyuki Tanaka | 2007-03-27 |
| 7018785 | Method for forming pattern and treating agent for use therein | Kazuyo Ono, Yusuke Takano, Hatsuyuki Tanaka | 2006-03-28 |
| 6686121 | Process for preparing resists | Hiroshi Okazaki, Georg Pawlowski, Yoshiaki Kinoshita, Yuko Yamaguchi | 2004-02-03 |
| 6527966 | Pattern forming method | Koji Shimomura, Yoshiaki Kinoshita, Yuko Yamaguchi | 2003-03-04 |
| 6479210 | Chemically amplified resist composition | Yoshiaki Kinoshita, Yuko Yamaguchi | 2002-11-12 |
| 6284427 | Process for preparing resists | Hiroshi Okazaki, Georg Pawlowski, Yoshiaki Kinoshita, Yuko Yamaguchi | 2001-09-04 |
| 6110639 | Radiation-sensitive composition and recording medium using the same | Seiya Masuda, Natsumi Kawasaki | 2000-08-29 |
| 5852128 | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Munirathna Padmanaban, Georg Pawlowski, Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda +1 more | 1998-12-22 |
| 5846690 | Radiation-sensitive composition containing plasticizer | Munirathna Padmanaban, Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda, Natsumi Kawasaki +1 more | 1998-12-08 |
| 5773191 | Radiation-sensitive composition | Munirathna Padmanaban, Yoshiaki Kinoshita, Natsumi Kawasaki, Hiroshi Okazaki, Georg Pawlowski | 1998-06-30 |
| 5738972 | Radiation sensitive composition | Munirathna Padmanaban, Natsumi Suehiro, Yoshiaki Kinoshita, Seiya Masuda, Hiroshi Okazaki +1 more | 1998-04-14 |
| 5406406 | Molecular crystal and wavelength conversion devices using the same | Hironobu Yamamoto, Kaoru Okaniwa | 1995-04-11 |
| 5383050 | Organic nonlinear optical material | Hironobu Yamamoto, Robert W. Johnson | 1995-01-17 |