Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7195863 | Development defect preventing process and material | Yusuke Takano, Kazuyo Ijima, Satoru Funato, Yoshio Murakami | 2007-03-27 |
| 7141177 | Etching method and composition for forming etching protective layer | — | 2006-11-28 |
| 7018785 | Method for forming pattern and treating agent for use therein | Kazuyo Ono, Yusuke Takano, Satoru Funato | 2006-03-28 |
| 6939661 | Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom | Wen-Bing Kang, Ken Kimura, Shoko Matsuo, Yoshinori Nishiwaki | 2005-09-06 |
| 6803168 | Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition | Munirathna Padmanaban, Wen-Bing Kang, Ken Kimura, Georg Pawlowski | 2004-10-12 |
| 6737492 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Munirathna Padmanaban, Ken Kimura, Takanori Kudo, Georg Pawlowski | 2004-05-18 |
| 6692892 | Composition for antireflection coating | Yusuke Takano, Dong-Han Lee | 2004-02-17 |
| 6555607 | Water-soluble resin composition | Takashi Kanda | 2003-04-29 |
| 6468718 | Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating | Wen-Bing Kang, Munirathna Padmanaban, Ken Kimura, Takanori Kudo, Georg Pawlowski | 2002-10-22 |
| 6465148 | Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom | Wen-Bing Kang, Ken Kimura, Shoko Matsuo, Yoshinori Nishiwaki | 2002-10-15 |
| 6465161 | Method for forming resist pattern | Wen-Bing Kang, Shoko Matsuo, Ken Kimura, Yoshinori Nishiwaki | 2002-10-15 |
| 6329117 | Antireflection or light-absorbing coating composition and polymer therefor | Munirathna Padmanaban, Wen-Bing Kang, Georg Pawlowski, Ken Kimura | 2001-12-11 |
| 6329126 | Developer solution for acitinic ray sensitive resist | Mitsuru Sato, Toshimasa Nakayama, Hiroshi Komano | 2001-12-11 |
| 6309789 | Composition for reflection reducing coating | Yusuke Takano, Kiyofumi Takano, Yutaka Hashimoto | 2001-10-30 |
| 6277750 | Composition for bottom reflection preventive film and novel polymeric dye for use in the same | Georg Pawlowski, Munirathna Padmanaban, Wen-Bing Kang, Ken Kimura, Yoshinori Nishiwaki | 2001-08-21 |
| 6255405 | Light-absorbing polymers and application thereof to anti-reflection film | Wen-Bing Kang, Yoshinori Nishiwaki, Ken Kimura, Syoko Matsuo | 2001-07-03 |
| 6184305 | Radiation absorbing polymer and synthesis thereof | Wen-Bing Kan, Akihiko Tokida, Kayo Aramaki, Ken Kimura | 2001-02-06 |
| 6080522 | Radiation-sensitive resist composition with high heat resistance | Hiromi Ito | 2000-06-27 |
| 5985525 | Developer solution for photoresist composition | Mitsuru Sato, Toshimasa Nakayama | 1999-11-16 |
| 5853471 | Composition for anti-reflection coating | Takeo Yoshida | 1998-12-29 |
| 5662961 | Method for forming a protective coating film on electronic parts and devices | Katsuya Tanitsu, Atsushi Kawakami, Toshimasa Nakayama | 1997-09-02 |
| 5614251 | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | Yoshinori Sakamoto, Yoshio Hagiwara, Toshimasa Nakayama | 1997-03-25 |
| 5543268 | Developer solution for actinic ray-sensitive resist | Mitsuru Sato, Toshimasa Nakayama, Hiroshi Komano | 1996-08-06 |
| 5520952 | Method for forming a protective coating film on electronic parts and devices | Katsuya Tanitsu, Atsushi Kawakami, Toshimasa Nakayama | 1996-05-28 |
| 5496402 | Method and liquid coating composition for the formation of silica-based coating film on substrate surface | Yoshinori Sakamoto, Yoshio Hagiwara, Toshimasa Nakayama | 1996-03-05 |