Issued Patents All Time
Showing 1–25 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6939926 | Phenol novolak resin, production process thereof, and positive photoresist composition using the same | Ken Miyagi, Yasuhide Ohuchi, Atsuko Hirata, Kousuke Doi, Hidekatsu Kohara | 2005-09-06 |
| 6815151 | Rinsing solution for lithography and method for processing substrate with the use of the same | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 2004-11-09 |
| 6620978 | Positive photoresist composition and process for synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Satoshi Niikura, Hidekatsu Kohara | 2003-09-16 |
| RE38254 | Positive resist composition | Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Banba | 2003-09-16 |
| 6566031 | Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern | Takako Suzuki, Kousuke Doi, Hidekatsu Kohara | 2003-05-20 |
| 6492085 | Positive photoresist composition and process and synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Satoshi Niikura, Hidekatsu Kohara | 2002-12-10 |
| 6475694 | Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group | Kousuke Doi, Ken Miyagi, Atsuko Hirata, Hidekatsu Kohara | 2002-11-05 |
| 6417317 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Kousuke Doi, Ryuusaku Takahashi, Hidekatsu Kohara | 2002-07-09 |
| 6406827 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Kousuke Doi, Hidekatsu Kohara | 2002-06-18 |
| 6379859 | Positive photoresist composition and process for forming resist pattern using same | Takako Suzuki, Sachiko Tamura, Kousuke Doi, Hidekatsu Kohara | 2002-04-30 |
| 6329126 | Developer solution for acitinic ray sensitive resist | Hatsuyuki Tanaka, Mitsuru Sato, Hiroshi Komano | 2001-12-11 |
| 6312863 | Positive photoresist composition | Shinichi Hidesaka, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara | 2001-11-06 |
| 6300033 | Positive photoresist composition and process for forming resist pattern | Takako Suzuki, Kousuke Doi, Hidekatsu Kohara | 2001-10-09 |
| 6296992 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Kousuke Doi, Hidekatsu Kohara | 2001-10-02 |
| 6291142 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 2001-09-18 |
| 6268108 | Composition for forming antireflective coating film and method for forming resist pattern using same | Etsuko Iguchi, Masakazu Kobayashi, Hiroshi Komano | 2001-07-31 |
| 6261745 | Post-ashing treating liquid compositions and a process for treatment therewith | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi, Hiroshi Komano | 2001-07-17 |
| 6245930 | Chemical-sensitization resist composition | Katsumi Oomori, Hideo Hada, Fumitake Kaneko, Mitsuru Sato, Kazufumi Sato | 2001-06-12 |
| 6225034 | Photoresist stripping liquid compositions and a method of stripping photoresists using the same | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 2001-05-01 |
| 6225030 | Post-ashing treating method for substrates | Masahito Tanabe, Kazumasa Wakiya, Masakazu Kobayashi | 2001-05-01 |
| 6214104 | Coating solution for forming silica coating and method of forming silica coating | Hiroyuki Iida, Hiroki Endo, Hideya Kobari, Yoshio Hagiwara | 2001-04-10 |
| 6207788 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Ken Miyagi, Kousuke Doi, Ryuusaku Takahashi, Hidekatsu Kohara | 2001-03-27 |
| 6207340 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Kousuke Doi, Hidekatsu Kohara | 2001-03-27 |
| 6187500 | Positive photoresist compositions and multilayer resist materials using same | Ken Miyagi, Kousuke Doi, Atsuko Hirata, Hidekatsu Kohara | 2001-02-13 |
| 6177226 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Satoshi Niikura, Miki Kobayashi, Kousuke Doi, Hidekatsu Kohara | 2001-01-23 |