Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7147984 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Ryusuke Uchida, Yukihiro Sawayanagi | 2006-12-12 |
| 6890697 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2005-05-10 |
| 6869745 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2005-03-22 |
| 6818380 | Method for the preparation of a semiconductor device | Satoshi Maemori, Kazufumi Sato, Kazuyuki Nitta, Kazuo Tani, Yohei Kinoshita +1 more | 2004-11-16 |
| 6815144 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2004-11-09 |
| 6777158 | Method for the preparation of a semiconductor device | Satoshi Maemori, Kazufumi Sato, Kazuyuki Nitta, Kazuo Tani, Yohei Kinoshita +1 more | 2004-08-17 |
| 6773863 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2004-08-10 |
| 6630282 | Crosslinked positive-working photoresist composition | Yohei Kinoshita, Tomotaka Yamada, Toshikazu Takayama | 2003-10-07 |
| 6548229 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2003-04-15 |
| 6485887 | Positive-working photoresist composition | Hiroto Yukawa, Akiyoshi Yamazaki, Kazuo Tani, Yohei Kinoshita, Tomotaka Yamada | 2002-11-26 |
| 6387587 | Positive-working chemical-amplification photoresist composition | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2002-05-14 |
| 6340553 | Positive-working photoresist composition | Hiroto Yukawa, Akiyoshi Yamazaki, Kazuo Tani, Yohei Kinoshita, Tomotaka Yamada | 2002-01-22 |
| 6284430 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2001-09-04 |
| 6255041 | Method for formation of patterned resist layer | Hiroto Yukawa, Ryusuke Uchida, Kazufumi Sato | 2001-07-03 |
| 6245930 | Chemical-sensitization resist composition | Hideo Hada, Fumitake Kaneko, Mitsuru Sato, Kazufumi Sato, Toshimasa Nakayama | 2001-06-12 |
| 6153354 | Electron beam negative working resist composition | Yasuhiko Katsumata, Kiyoshi Ishikawa | 2000-11-28 |
| 6087068 | Undercoating composition for photolithographic resist | Mitsuru Sato, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko | 2000-07-11 |
| 6083665 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko, Toshimasa Nakayama | 2000-07-04 |
| 6042988 | Chemical-amplification-type negative resist composition | Mitsuro Sato, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko, Yoshiki Sugeta | 2000-03-28 |
| 5976760 | Chemical-sensitization resist composition | Hideo Hada, Fumitake Kaneko, Mitsuru Sato, Kazufumi Sato, Toshimasa Nakayama | 1999-11-02 |
| 5939510 | Undercoating composition for photolithographic resist | Mitsuru Sato, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko | 1999-08-17 |
| 5925495 | Photoresist laminate and method for patterning using the same | Mitsuru Sato, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko, Toshimasa Nakayama | 1999-07-20 |
| 5908738 | Undercoating composition for photolithography | Mitsuru Sato, Kiyoshi Ishikawa, Etsuko Iguchi, Toshimasa Nakayama | 1999-06-01 |
| 5789136 | Negative-working photoresist composition | Mitsuru Sato, Kiyoshi Ishikawa, Etsuko Iguchi, Fumitake Kaneko | 1998-08-04 |
| 5756255 | Undercoating composition for photolithography | Mitsuru Sato, Kiyoshi Ishikawa, Etsuko Iguchi, Toshimasa Nakayama | 1998-05-26 |