Issued Patents All Time
Showing 1–25 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12099298 | Resist composition and method of forming resist pattern | Masaru Takeshita, Masahito Yahagi | 2024-09-24 |
| 10344359 | Aluminum alloy clad sheet and aluminum alloy clad structural member | Katsushi Matsumoto | 2019-07-09 |
| 10272645 | Aluminum-alloy-clad plate and aluminum-alloy-clad structural member | Katsushi Matsumoto | 2019-04-30 |
| 9964851 | Resist pattern forming method and developer for lithography | Mitsuo Hagihara, Tomoya Kumagai, Masahito Yahagi, Kenta Suzuki, Takayoshi Mori +1 more | 2018-05-08 |
| 8828304 | Method of forming resist pattern by nanoimprint lithography | Tomotaka Yamada | 2014-09-09 |
| 8216763 | Photosensitive resin composition and method of forming pattern | Yasushi Fujii, Hisanobu Harada, Koji Yonemura, Isamu Takagi, Daisuke Kawana +2 more | 2012-07-10 |
| 7666569 | Positive resist composition and method for forming resist pattern | Mitsuo Hagihara, Daisuke Kawana | 2010-02-23 |
| 6890697 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2005-05-10 |
| 6869745 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2005-03-22 |
| 6818380 | Method for the preparation of a semiconductor device | Satoshi Maemori, Kazuyuki Nitta, Katsumi Oomori, Kazuo Tani, Yohei Kinoshita +1 more | 2004-11-16 |
| 6815144 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2004-11-09 |
| 6787290 | Positive-working photoresist composition and resist patterning method using same | Kazuyuki Nitta, Daisuke Kawana, Satoshi Shimatani | 2004-09-07 |
| 6777158 | Method for the preparation of a semiconductor device | Satoshi Maemori, Kazuyuki Nitta, Katsumi Oomori, Kazuo Tani, Yohei Kinoshita +1 more | 2004-08-17 |
| 6773863 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2004-08-10 |
| 6677103 | Positive-working photoresist composition | Satoshi Maemori, Taku Nakao, Kazuyuki Nitta | 2004-01-13 |
| 6673516 | Coating composition for chemically amplified positive resist and method of patterning resist using the same | Satoshi Kumon | 2004-01-06 |
| 6638684 | Photosensitive laminate, process for forming resist pattern using same and positive resist composition | Waki Okubo, Kazuyuki Nitta, Toshiyuki Ogata | 2003-10-28 |
| RE38254 | Positive resist composition | Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Banba, Toshimasa Nakayama | 2003-09-16 |
| 6548229 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2003-04-15 |
| 6444394 | Positive-working photoresist composition | Satoshi Maemori, Taku Nakao, Kazuyuki Nitta | 2002-09-03 |
| 6388101 | Chemical-sensitization photoresist composition | Hideo Hada, Hiroshi Komano | 2002-05-14 |
| 6387587 | Positive-working chemical-amplification photoresist composition | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2002-05-14 |
| 6284430 | Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2001-09-04 |
| 6255041 | Method for formation of patterned resist layer | Katsumi Oomori, Hiroto Yukawa, Ryusuke Uchida | 2001-07-03 |
| 6245930 | Chemical-sensitization resist composition | Katsumi Oomori, Hideo Hada, Fumitake Kaneko, Mitsuru Sato, Toshimasa Nakayama | 2001-06-12 |