Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8399173 | Resist composition and resist pattern forming method | Shoichi Fujita, Tomoharu Takahashi, Hirokazu Ozaki | 2013-03-19 |
| 7407739 | Resist developer and resist pattern formation method using same | — | 2008-08-05 |
| 7402372 | Positive resist composition and method of forming resist pattern | Mitsuo Hagihara, Taku Nakao | 2008-07-22 |
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern | Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Niikura, Satoshi Shimatani +3 more | 2008-04-15 |
| 7329478 | Chemical amplified positive photo resist composition and method for forming resist pattern | Yusuke Nakagawa, Shinichi Hidesaka, Kenji Maruyama, Satoshi Shimatani, Masahiro Masujima | 2008-02-12 |
| 7232643 | Positive resist composition and compound used therein | — | 2007-06-19 |
| 7192687 | Positive resist composition and method of forming resist pattern using same | Waki Ohkubo, Satoshi Shimatani | 2007-03-20 |
| 7150956 | Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device | Takeyoshi Mimura, Satoshi Shimatani, Waki Okubo, Tatsuya Matsumi | 2006-12-19 |
| 7094924 | Method for decreasing surface defects of patterned resist layer | Taku Nakao, Satoshi Maemori, Tatsuya Matsumi | 2006-08-22 |
| 6921621 | Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device | Takeyoshi Mimura, Satoshi Shimatani, Waki Okubo, Tatsuya Matsumi | 2005-07-26 |
| 6818380 | Method for the preparation of a semiconductor device | Satoshi Maemori, Kazufumi Sato, Katsumi Oomori, Kazuo Tani, Yohei Kinoshita +1 more | 2004-11-16 |
| 6787290 | Positive-working photoresist composition and resist patterning method using same | Kazufumi Sato, Daisuke Kawana, Satoshi Shimatani | 2004-09-07 |
| 6777158 | Method for the preparation of a semiconductor device | Satoshi Maemori, Kazufumi Sato, Katsumi Oomori, Kazuo Tani, Yohei Kinoshita +1 more | 2004-08-17 |
| 6677103 | Positive-working photoresist composition | Kazufumi Sato, Satoshi Maemori, Taku Nakao | 2004-01-13 |
| 6638684 | Photosensitive laminate, process for forming resist pattern using same and positive resist composition | Waki Okubo, Kazufumi Sato, Toshiyuki Ogata | 2003-10-28 |
| RE38254 | Positive resist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Banba, Toshimasa Nakayama | 2003-09-16 |
| 6605417 | Method for decreasing surface defects of patterned resist layer | Taku Nakao, Satoshi Maemori, Tatsuya Matsumi | 2003-08-12 |
| 6444394 | Positive-working photoresist composition | Kazufumi Sato, Satoshi Maemori, Taku Nakao | 2002-09-03 |
| 6159652 | Positive resist composition | Mitsuru Sato, Akiyoshi Yamazaki, Etsuko Iguchi, Yoshika Sakai, Kazufumi Sato +1 more | 2000-12-12 |
| 5955240 | Positive resist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-09-21 |
| 5948589 | Positive-working photoresist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-09-07 |
| 5945517 | Chemical-sensitization photoresist composition | Kazufumi Sato, Toshiharu Shimamaki, Kunio Hayakawa, Shin-ya Kuramoto | 1999-08-31 |
| 5945248 | Chemical-sensitization positive-working photoresist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-08-31 |
| 5908730 | Chemical-sensitization photoresist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-06-01 |
| 5874195 | Positive-working photoresist composition | Kazufumi Sato, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama | 1999-02-23 |