Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern | Kenji Maruyama, Masaki Kurihara, Ken Miyagi, Satoshi Shimatani, Masahiro Masujima +3 more | 2008-04-15 |
| 6964838 | Positive photoresist composition | Masaki Kurihara, Takako Suzuki, Kenji Maruyama, Kousuke Doi | 2005-11-15 |
| 6869742 | Positive photoresist composition | Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Kousuke Doi | 2005-03-22 |
| 6620978 | Positive photoresist composition and process for synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Hidekatsu Kohara, Toshimasa Nakayama | 2003-09-16 |
| 6492085 | Positive photoresist composition and process and synthesizing polyphenol compound | Satoshi Shimatani, Ken Miyagi, Hidekatsu Kohara, Toshimasa Nakayama | 2002-12-10 |
| 6296992 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Miki Kobayashi, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-10-02 |
| 6207340 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Miki Kobayashi, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-03-27 |
| 6177226 | Positive photoresist composition and process for forming contact hole | Masaki Kurihara, Miki Kobayashi, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 2001-01-23 |
| 6106994 | Production process of polyphenol diesters, and positive photosensitive compositions | Hidekatsu Kohara, Toshimasa Nakayama | 2000-08-22 |
| 5738968 | Positive photoresist composition | Hiroshi Hosoda, Taku Hirayama, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1998-04-14 |
| 5728504 | Positive photoresist compositions and multilayer resist materials using the same | Hiroshi Hosoda, Atsushi Sawano, Tatsuya Hashiguchi, Kazuyuki Nitta, Hidekatsu Kohara +1 more | 1998-03-17 |
| 5702861 | Positive photoresist composition | Takako Suzuki, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama | 1997-12-30 |
| 5518860 | Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound | Jun Koshiyama, Tetsuya Kato, Kouichi Takahashi, Hidekatsu Kohara, Toshimasa Nakayama | 1996-05-21 |
| 5384228 | Alkali-developable positive-working photosensitive resin composition | Kousuke Doi, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1995-01-24 |
| 5332647 | "Positive-working quinone diazide composition containing N,N',N""-substituted isocyanurate compound and associated article" | Hayato Ohno, Nobuo Tokutake, Hidekatsu Kohara, Toshimasa Nakayama | 1994-07-26 |