MK

Miki Kobayashi

TC Tokyo Ohka Kogyo Co.: 4 patents #253 of 684Top 40%
SC Shin-Etsu Chemical Co.: 3 patents #839 of 2,176Top 40%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
Sumitomo Electric Industries: 2 patents #9,741 of 21,551Top 50%
AP Astellas Pharma: 1 patents #544 of 954Top 60%
OL Olympus: 1 patents #2,078 of 3,097Top 70%
YC Yamanouchi Pharmaceutical Co.: 1 patents #277 of 516Top 55%
ML Mitsubishi Petrochemical Company Limited: 1 patents #291 of 670Top 45%
Overall (All Time): #282,266 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
D1061470 Telephone handset 2025-02-11
D1059322 Telephone base unit 2025-01-28
D824105 Electric clipper Tomoaki Ino, Mikiyasu Ishikura, Kensaku Okabe 2018-07-24
8068165 Imaging apparatus 2011-11-29
D558754 Personal computer Hirofumi Takemasa 2008-01-01
7196080 Phenylpyridinecarbonylpiperazinederivative Masahiro Iwata, Noriyuki Kawano, Hiroyuki Kaizawa, Tomofumi Takuwa, Issei Tsukamoto +3 more 2007-03-27
6740662 Naphthyridine derivatives Masahiro Iwata, Noriyuki Kawano, Tomofumi Takuwa, Ryota Shiraki, Makoto Takeuchi 2004-05-25
D483356 Portable computer 2003-12-09
6440646 Positive resist composition suitable for lift-off technique and pattern forming method Takafumi Ueda, Hideto Kato, Toshihiko Fujii 2002-08-27
6296992 Positive photoresist composition and process for forming contact hole Masaki Kurihara, Satoshi Niikura, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2001-10-02
6210855 Positive resist composition suitable for lift-off technique and pattern forming method Takafumi Ueda, Hideto Kato, Toshihiko Fujii 2001-04-03
6207340 Positive photoresist composition and process for forming contact hole Masaki Kurihara, Satoshi Niikura, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2001-03-27
6177226 Positive photoresist composition and process for forming contact hole Masaki Kurihara, Satoshi Niikura, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama 2001-01-23
6127087 Positive photoresist compositions and multilayer resist materials using same Kousuke Doi, Sachiko Tamura, Hidekatsu Kohara, Toshimasa Nakayama 2000-10-03
5773200 Positive resist composition suitable for lift-off technique and pattern forming method Satoshi Okazaki, Kazuhiro Nishikawa, Masaru Kobayashi, Mitsuo Umemura, Toshinobu Ishihara 1998-06-30
5185262 DNA fragment containing gene which encodes the function of stabilizing plasmid in host microorganism Keiko Kohama, Yasurou Kurusu, Hideaki Yukawa, Makiko Fukushima 1993-02-09